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author:

Wang, Hong (Wang, Hong.) [1] | Cui, Wen (Cui, Wen.) [2] | Dong, Xing'an (Dong, Xing'an.) [3] | Li, Jieyuan (Li, Jieyuan.) [4] | Chen, Qiaoshan (Chen, Qiaoshan.) [5] (Scholars:陈巧珊) | Wang, Zhiming (Wang, Zhiming.) [6] | Sun, Yanjuan (Sun, Yanjuan.) [7] | Sheng, Jianping (Sheng, Jianping.) [8] | Zhou, Ying (Zhou, Ying.) [9] | Zhang, Yuxin (Zhang, Yuxin.) [10] | Dong, Fan (Dong, Fan.) [11]

Indexed by:

EI Scopus SCIE

Abstract:

The interfacial structure plays a key role for photoinduced charge transfer and molecular activation in heterogenous photocatalysis. However, the specific interfacial electronic structure of heterostructure and its effect on the photocatalysis reaction have remained unclear. Herein, insulator-based heterostructure (CaSO4-BiOI) was constructed to investigate the atomic interfacial structure. The interface in CaSO4-BiOI heterostructure presents electron-rich environment which could enhance the electronic interaction between catalyst surface and reactants, and thus promotes activation and dissociation of reactants. Taking photocatalytic NO oxidation as target reaction, the adsorption-reaction process was dynamically monitored by in situ DRIFT and plenty of reaction intermediates were observed. The generation of new activated molecules and intermediates could provide an alternative pathway to enhance the conversion of inert pollutant. Hence, the reactants and intermediates can be smoothly converted to the final products with the assistance of electron-rich environment at the interface of heterostructure, achieving the safe and efficient photocatalytic performance.

Keyword:

Charge separation and transfer Electron-rich environment Insulator-based heterostructures Interfacial activation Photocatalytic reaction

Community:

  • [ 1 ] [Wang, Hong]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China
  • [ 2 ] [Cui, Wen]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China
  • [ 3 ] [Dong, Xing'an]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China
  • [ 4 ] [Li, Jieyuan]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China
  • [ 5 ] [Wang, Zhiming]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China
  • [ 6 ] [Sun, Yanjuan]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China
  • [ 7 ] [Sheng, Jianping]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China
  • [ 8 ] [Dong, Fan]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China
  • [ 9 ] [Sun, Yanjuan]Univ Elect Sci & Technol China, Sch Resources & Environm, Chengdu 611731, Peoples R China
  • [ 10 ] [Chen, Qiaoshan]Fuzhou Univ, Dept Environm Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 11 ] [Cui, Wen]Southwest Petr Univ, Ctr New Energy Mat & Technol, Sch New Energy & Mat, Chengdu 610500, Peoples R China
  • [ 12 ] [Zhou, Ying]Southwest Petr Univ, Ctr New Energy Mat & Technol, Sch New Energy & Mat, Chengdu 610500, Peoples R China
  • [ 13 ] [Zhang, Yuxin]Chongqing Univ, Coll Mat Sci & Engn, Chongqing 400044, Peoples R China

Reprint 's Address:

  • [Sun, Yanjuan]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China;;[Dong, Fan]Univ Elect Sci & Technol China, Res Ctr Environm Sci & Technol, Inst Fundamental & Frontier Sci, Chengdu 611731, Peoples R China

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Source :

CHEMICAL ENGINEERING JOURNAL

ISSN: 1385-8947

Year: 2020

Volume: 390

1 3 . 2 7 3

JCR@2020

1 3 . 4 0 0

JCR@2023

ESI Discipline: ENGINEERING;

ESI HC Threshold:132

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 45

SCOPUS Cited Count: 46

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

Online/Total:132/10046363
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