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author:

Sun, Xiaojuan (Sun, Xiaojuan.) [1] | Zhang, Jie (Zhang, Jie.) [2] | Fu, Zhiyong (Fu, Zhiyong.) [3]

Indexed by:

EI Scopus SCIE

Abstract:

An efficient photocatalyst based on the broadband solar response molecular system was designed and constructed for pollutant degradation in near-neutral conditions via utilizing guest polyoxometalate cluster sensitized with electron deficient host network. Photoelectrochemical analysis reveals electron hole pairs are generated efficiently upon both visible and NIR light excitation. Its photocatalytic activity in the visible and NIR light regions is enhanced because of the contribution from the broad absorption of copper-viologen framework and the strong host guest interactions. This stable heterogeneous catalyst is easily recollected and regenerated without the loss of activity for the next cycle.

Keyword:

broadband solar response copper-viologen framework crystalline material metal organic framework photocatalysis polyoxometalate cluster

Community:

  • [ 1 ] [Sun, Xiaojuan]South China Univ Technol, Key Lab Fuel Cell Technol Guangdong Prov, Sch Chem & Chem Engn, Guangzhou 510640, Guangdong, Peoples R China
  • [ 2 ] [Zhang, Jie]South China Univ Technol, Key Lab Fuel Cell Technol Guangdong Prov, Sch Chem & Chem Engn, Guangzhou 510640, Guangdong, Peoples R China
  • [ 3 ] [Fu, Zhiyong]South China Univ Technol, Key Lab Fuel Cell Technol Guangdong Prov, Sch Chem & Chem Engn, Guangzhou 510640, Guangdong, Peoples R China
  • [ 4 ] [Sun, Xiaojuan]Fuzhou Univ, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Fujian, Peoples R China
  • [ 5 ] [Fu, Zhiyong]Fuzhou Univ, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Fujian, Peoples R China

Reprint 's Address:

  • 蔡其洪

    [Fu, Zhiyong]South China Univ Technol, Key Lab Fuel Cell Technol Guangdong Prov, Sch Chem & Chem Engn, Guangzhou 510640, Guangdong, Peoples R China;;[Fu, Zhiyong]Fuzhou Univ, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Fujian, Peoples R China

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Source :

ACS APPLIED MATERIALS & INTERFACES

ISSN: 1944-8244

Year: 2018

Issue: 42

Volume: 10

Page: 35671-35675

8 . 4 5 6

JCR@2018

8 . 5 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:284

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 52

SCOPUS Cited Count: 54

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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