Nanostructured　TiO2　films　were　grown　on　a　monocrystalline　silicon　substrate　by　a　femtosecond　pulsed　laser　ablating　a　Ti　target　in　atmosphere　without　a　vacuum　chamber.　FESEM　and　XPS　results　showed　that　the　TiO2　nanomaterials　prepared　by　this　method　have　a　fluffy　structure　composed　of　nanoparticles　which　have　a　particle　size　in　the　range　of　1-100　nm,　resulting　in　a　high　specific　surface　area　of　88.6　m(2)/g.　XRD　results　showed　that　the　deposited　films　have　a　composited　phase　which　is　composed　of　anatase,　rutile　and　amorphous　TiO2.　The　reason　for　the　formation　of　this　nanostructure　is　mainly　because　of　the　collision　with　gas　molecules　and　oxidation　reaction　of　Ti　ions.　The　method　may　be　used　to　prepare　other　metal　oxide　nanostructured　films.　(C)　2017　Author(s).