In　this　paper,　we　present　a　new,　to　the　best　of　our　knowledge,　structure　of　double　pinhole/micro-lens　array　(DP/MLA)　with　two　center-depth　planes,　used　for　improving　the　depth-of-field　(DOF)　of　integral　imaging　(II),　which　can　be　fabricated　by　a　combination　of　lithography　and　inkjet　printing.　The　results　show　that　a　black　circular　groove　array　prepared　by　lithography　can　be　used　for　micro-lens　location　and　reduce　the　stray　light　for　II.　By　controlling　the　parameters　of　the　inkjet　printing　system,　DP/MLA　with　high　precision,　high　alignment,　and　good　focusing　ability　can　be　achieved.　When　the　fabricated　DP/MLA　is　applied　in　the　II　system,　the　reconstructed　image　has　a　better　three-dimensional　(3D)　image　with　higher　DOF　than　that　by　traditional　MLA　and　higher　quality　than　that　by　ordinary　double-layer　MLA.　©　2020　Optical　Society　of　America