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author:

Ke, Chaozhen (Ke, Chaozhen.) [1] | Xu, Canhua (Xu, Canhua.) [2] (Scholars:许灿华) | Huang, Yantang (Huang, Yantang.) [3] | Ma, Jing (Ma, Jing.) [4]

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EI PKU CSCD

Abstract:

The SiO2 microsphere cavity and the TiO2-SiO2 hybrid microsphere cavity with diameters of 206 μm are prepared with the electrode spark discharge method and the sol-gel method. The Q values of two microsphere cavities at 1550 nm are 2.15×107 and 1.36×106, respectively. The broadband resonant transmission spectra show that compared with those in the same size of SiO2 microsphere cavity,the absorption depth ratios of the resonant peaks of the high-order whispering gallery modes in the hybrid microsphere cavity increase obviously, indicating that the high-order modes are effectively excited. Moreover, the average red shift of the resonant wavelengths is 0.706 nm and the corresponding free spectral range is reduced by 0.020 nm, indicating that the resonant characteristics of the SiO2 microsphere cavity can be effectively tailored by the TiO2 film. The average red shift of resonant wavelength and the average reduction of free spectral range of the microsphere cavity with a diameter of 134 μm are 1.012 nm and 0.022 nm, respectively, indicating that small size microsphere cavities have strong resonance-tailoring capability. © 2019, Chinese Lasers Press. All right reserved.

Keyword:

Doppler effect Film preparation Microspheres Optical resonators Oxide minerals Red Shift Silica Silicon Sol-gel process Sol-gels Spectroscopy Titanium dioxide Whispering gallery modes

Community:

  • [ 1 ] [Ke, Chaozhen]College of Physics and Information Engineering, Fuzhou University, Fuzhou; Fujian; 350108, China
  • [ 2 ] [Xu, Canhua]College of Physics and Information Engineering, Fuzhou University, Fuzhou; Fujian; 350108, China
  • [ 3 ] [Huang, Yantang]College of Physics and Information Engineering, Fuzhou University, Fuzhou; Fujian; 350108, China
  • [ 4 ] [Ma, Jing]College of Physics and Information Engineering, Fuzhou University, Fuzhou; Fujian; 350108, China

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Source :

Chinese Journal of Lasers

ISSN: 0258-7025

Year: 2019

Issue: 2

Volume: 46

1 . 8 0 0

JCR@2023

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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