Nano　scanning　auger　system,　molecular　dynamics　simulations　and　coalescence　experiments　were　employed　to　study　the　oxide　film　structure　of　A356　alloy　chips　and　the　behaviors　of　salt　fluxes　containing　alkali　fluorides　wetting　and　melting　oxide　films.　Moreover,　the　coalescence　mechanism　was　discussed.　The　results　show　that　equimolar　NaCl-KCl　with　addition　of　NaF　or　Na3AlF6　wetted　well　with　Al2O3　inclusions　but　addition　of　AlF3.　Eequimolar　NaCl-KCl　containing　alkali　fluorides　can　melt　oxide　film　and　promote　the　coalescence　of　wrapped　aluminum　droplets　in　molten　fluxes.　The　effects　of　NaF　and　Na3AlF6　on　coalescence　are　more　significant　than　that　of　AlF3.　The　coalescence　mechanism　analysis　results　show　that　free　F-　ions　are　the　premise　for　chips　coalescence　and　the　wetting　between　fluxes　and　Al2O3　inclusions　improve　the　coalescence　degree.　Aluminum　droplets　can　coalesce　spontaneously　in　molten　fluxes　and　the　non-wetting　between　fluxes　and　aluminum　liquid　is　benefit　for　the　coalescence,　but　the　improvement　of　fluxes　viscosity　by　Na3AlF6　will　resist　the　coalescence　of　small　aluminum　droplets.　©　2018,　Science　Press.　All　right　reserved.