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author:

Hu, Daobing (Hu, Daobing.) [1] | Zhang, Guocheng (Zhang, Guocheng.) [2] | Yang, Huihuang (Yang, Huihuang.) [3] | Zhang, Jun (Zhang, Jun.) [4] | Chen, Cihai (Chen, Cihai.) [5] | Lan, Shuqiong (Lan, Shuqiong.) [6] | Chen, Huipeng (Chen, Huipeng.) [7] | Guo, Tailiang (Guo, Tailiang.) [8]

Indexed by:

EI

Abstract:

A novel nonvolatile floating-gate transistor memory device using CdSe@ZnS quantum dots (QDs) embedded the insulating polymer as a charge-storage layer along with the rational design of device structure is presented. The core-shell structure CdSe@ZnS QDs can efficiently trap both holes and electrons under the applied writing/erasing operations, resulting in a considerable threshold voltage shifts (Δ VTH) over 50 V and forming high-conductance (ON) and low-conductance (OFF) states at a gate voltage of 0 V. The value of threshold voltage shift is controlled by writing and erasing voltages, regardless with source-drain voltages. Furthermore, it exhibits a long retention time (the Δ VTH can maintain 76% at 108 s) and outstanding endurance characteristics (>500 cycles), demonstrating extraordinary stable and reliable memory property. Moreover, a thin layer of Al2O3 was introduced as tunneling dielectric layer which is essential for the high-performance floating-gate transistor memory device. The nonvolatile organic transistor memory devices using QDs-based floating gate show great potential application for high-performance organic memory devices. © 1963-2012 IEEE.

Keyword:

Alumina Aluminum oxide Cadmium compounds II-VI semiconductors Nanocrystals Nonvolatile storage Semiconductor quantum dots Threshold voltage Transistors Zinc sulfide

Community:

  • [ 1 ] [Hu, Daobing]National and Local United Engineering Laboratory of Flat Panel Display Technology, Institute of Optoelectronic Display, Fuzhou University, Fuzhou; 350002, China
  • [ 2 ] [Zhang, Guocheng]National and Local United Engineering Laboratory of Flat Panel Display Technology, Institute of Optoelectronic Display, Fuzhou University, Fuzhou; 350002, China
  • [ 3 ] [Yang, Huihuang]National and Local United Engineering Laboratory of Flat Panel Display Technology, Institute of Optoelectronic Display, Fuzhou University, Fuzhou; 350002, China
  • [ 4 ] [Zhang, Jun]National and Local United Engineering Laboratory of Flat Panel Display Technology, Institute of Optoelectronic Display, Fuzhou University, Fuzhou; 350002, China
  • [ 5 ] [Chen, Cihai]National and Local United Engineering Laboratory of Flat Panel Display Technology, Institute of Optoelectronic Display, Fuzhou University, Fuzhou; 350002, China
  • [ 6 ] [Lan, Shuqiong]National and Local United Engineering Laboratory of Flat Panel Display Technology, Institute of Optoelectronic Display, Fuzhou University, Fuzhou; 350002, China
  • [ 7 ] [Chen, Huipeng]National and Local United Engineering Laboratory of Flat Panel Display Technology, Institute of Optoelectronic Display, Fuzhou University, Fuzhou; 350002, China
  • [ 8 ] [Guo, Tailiang]National and Local United Engineering Laboratory of Flat Panel Display Technology, Institute of Optoelectronic Display, Fuzhou University, Fuzhou; 350002, China

Reprint 's Address:

  • [chen, huipeng]national and local united engineering laboratory of flat panel display technology, institute of optoelectronic display, fuzhou university, fuzhou; 350002, china

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Source :

IEEE Transactions on Electron Devices

ISSN: 0018-9383

Year: 2017

Issue: 9

Volume: 64

Page: 3816-3821

2 . 6 2

JCR@2017

2 . 9 0 0

JCR@2023

ESI HC Threshold:177

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 29

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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