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author:

Sun, Xiaoxiang (Sun, Xiaoxiang.) [1] | Chen, Yu (Chen, Yu.) [2] | Zhao, Jianxi (Zhao, Jianxi.) [3]

Indexed by:

EI

Abstract:

Commercially available fumed silica (F-SiO2) was hydrophobised in situ via the interaction with a cationic gemini surfactant, ethanediyl-α,ω-bis(tetradecyldimethyl-ammonium bromide) (14-2-14), in aqueous solution. The effect of this surfactant modification was far higher that carried out by its corresponding monomer, tetradecyltrimethylammonium bromide (C14TABr). The mechanism of modification was assumed according to zeta potential measurements and observations of physical appearance. These particles were used to generate and stabilize aqueous foams. Both the foaming efficiency and the stabilising ability of F-SiO2/14-2-14 all exceeded that of F-SiO2/C14TAB. In the gemini case, the synergism and competition between the particles and the free surfactant molecules for their adsorption at the foam film were found, which resulted in two peaks in the foam stability curve. Dilational rheology of the films was measured using an oscillating drop technique. There were also two maxima in the dilational elasticity for the F-SiO2/14-2-14 system, respectively corresponding to each maximum in foam stability. © The Royal Society of Chemistry 2016.

Keyword:

Silica Surface active agents

Community:

  • [ 1 ] [Sun, Xiaoxiang]Institute of Colloid and Interface Chemistry, College of Chemistry and Chemical Engineering, Fuzhou University, Fuzhou; Fujian; 350108, China
  • [ 2 ] [Chen, Yu]Institute of Colloid and Interface Chemistry, College of Chemistry and Chemical Engineering, Fuzhou University, Fuzhou; Fujian; 350108, China
  • [ 3 ] [Zhao, Jianxi]Institute of Colloid and Interface Chemistry, College of Chemistry and Chemical Engineering, Fuzhou University, Fuzhou; Fujian; 350108, China

Reprint 's Address:

  • [zhao, jianxi]institute of colloid and interface chemistry, college of chemistry and chemical engineering, fuzhou university, fuzhou; fujian; 350108, china

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Source :

RSC Advances

Year: 2016

Issue: 45

Volume: 6

Page: 38913-38918

3 . 1 0 8

JCR@2016

3 . 9 0 0

JCR@2023

ESI HC Threshold:235

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 14

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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