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author:

Liu, Yang (Liu, Yang.) [1] | Li, Fushan (Li, Fushan.) [2] | Chen, Zhixin (Chen, Zhixin.) [3] | Guo, Tailiang (Guo, Tailiang.) [4] | Wu, Chaoxing (Wu, Chaoxing.) [5] | Kim, Tae Whan (Kim, Tae Whan.) [6]

Indexed by:

EI

Abstract:

In this work, a resistance switching memory based on organic/inorganic hybrid perovskites (OIHPs) was fabricated. The CH3NH3PbI3 perovskite was grown on polymethyl methacrylate (PMMA) as the resistance switching layer by using a two-step spin-coating procedure. The conduction mechanisms of indium-tin-oxide (ITO)/PMMA/CH3NH3PbI3/PMMA/Ag device were investigated in terms of current-voltage characteristics. The memory device is reprogrammable and the ON/OFF ratio reaches as high as 103. Endurance cycle of the as-fabricated memory device was also carried out. The results indicate the promising electronic application of OIHPs in resistance switching memories. © 2016 Elsevier Ltd. All rights reserved.

Keyword:

Current voltage characteristics Data storage equipment Hybrid materials Perovskite Polymethyl methacrylates Switching Tin oxides

Community:

  • [ 1 ] [Liu, Yang]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 2 ] [Li, Fushan]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 3 ] [Chen, Zhixin]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 4 ] [Guo, Tailiang]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 5 ] [Wu, Chaoxing]Department of Department of Electronics and Computer Engineering, Hanyang University, Seoul; 133-791, Korea, Republic of
  • [ 6 ] [Kim, Tae Whan]Department of Department of Electronics and Computer Engineering, Hanyang University, Seoul; 133-791, Korea, Republic of

Reprint 's Address:

  • [li, fushan]institute of optoelectronic technology, fuzhou university, fuzhou; 350002, china

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Source :

Vacuum

ISSN: 0042-207X

Year: 2016

Volume: 130

Page: 109-112

1 . 5 3

JCR@2016

3 . 8 0 0

JCR@2023

ESI HC Threshold:324

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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