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author:

Ma, Zehao (Ma, Zehao.) [1] | Ooi, Poh Choon (Ooi, Poh Choon.) [2] | Li, Fushan (Li, Fushan.) [3] | Yun, Dong Yeol (Yun, Dong Yeol.) [4] | Kim, Tae Whan (Kim, Tae Whan.) [5]

Indexed by:

EI

Abstract:

Nonvolatile memory (NVM) devices based on a metal–insulator–metal structure consisting of CdSe/ZnS quantum dots embedded in polymethylsilsesquioxane dielectric layers were fabricated. The current–voltage (I–V) curves showed a bistable current behavior and the presence of hysteresis. The current–time (I–t) curves showed that the fabricated NVM memory devices were stable up to 1 × 104 s with a distinct ON/OFF ratio of 104 and were reprogrammable when the endurance test was performed. The extrapolation of the I–t curve to 105 s with corresponding current ON/OFF ratio 1 × 105 indicated a long performance stability of the NVM devices. Schottky emission, Poole–Frenkel emission, trapped-charge limited-current and Child–Langmuir law were proposed as the dominant conduction mechanisms for the fabricated NVM devices based on the obtained I–V characteristics. © 2015, The Minerals, Metals & Materials Society.

Keyword:

Cadmium compounds II-VI semiconductors Nanocrystals Nonvolatile storage Semiconductor quantum dots

Community:

  • [ 1 ] [Ma, Zehao]Department of Electronics and Computer Engineering, Hanyang University, Seoul, Korea, Republic of
  • [ 2 ] [Ooi, Poh Choon]Institute of Optoelectronic Display, Fuzhou University, Fuzhou, China
  • [ 3 ] [Li, Fushan]Institute of Optoelectronic Display, Fuzhou University, Fuzhou, China
  • [ 4 ] [Yun, Dong Yeol]Department of Electronics and Computer Engineering, Hanyang University, Seoul, Korea, Republic of
  • [ 5 ] [Kim, Tae Whan]Department of Electronics and Computer Engineering, Hanyang University, Seoul, Korea, Republic of

Reprint 's Address:

  • [kim, tae whan]department of electronics and computer engineering, hanyang university, seoul, korea, republic of

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Source :

Journal of Electronic Materials

ISSN: 0361-5235

Year: 2015

Issue: 10

Volume: 44

Page: 3962-3966

1 . 4 9 1

JCR@2015

2 . 2 0 0

JCR@2023

ESI HC Threshold:335

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 7

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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