The　analytical　solution　models　have　been　constructed　to　describe　the　slip　flow　in　the　micro/nano　gaps　with　moving　boundary,　including　the　case　of　immersion　lithography.　The　two-dimensional　computational　fluid　dynamics　models　are　established　to　validate　them.　The　results　show　that　the　slip　flow　varies　with　time　and　tends　to　a　steady　state　quickly.　The　transient　and　steady　states　are　investigated　respectively　to　overall　describe　the　slip　flow,　and　there　are　significant　differences　between　the　slip　and　non-slip　flow.　Moreover,　the　stationary　liquid　on　moving　wall　may　be　generated　when　the　direction　of　pressure-driven　flow　is　opposite　to　the　direction　of　shear　flow.　This　phenomenon　is　important　to　prevent　liquid　leakage　during　wafer　scanning,　and　the　corresponding　parameters　are　optimized　to　improve　the　quality　of　advanced　immersion　lithography.　©　2014　Elsevier　B.V.　All　rights　reserved.