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author:

Xiao, F.-X. (Xiao, F.-X..) [1] | Liu, B. (Liu, B..) [2]

Indexed by:

Scopus

Abstract:

Surface plasmon resonance (SPR) effect of metal nanostructures is established as an efficient and attractive strategy to boost visible-light or even near-infrared-responsive photo-electrochemical (PEC) water splitting devices for substantial solar-to-chemical energy conversion. Rational integration of plasmonic metal nanostructures with semiconductors in an appropriate fashion is beneficial for creating a large variety of plasmonic metal/semiconductor photoelectrodes. However, up to date, construction of well-defined and highly efficient plasmonic metal/semiconductor heterostructures is still in its infant stage. In this review, basic principles of PEC water splitting over semiconductors, SPR-excited plasmonic effect of metal nanostructures, and their intrinsic correlation with each other are first concisely introduced. Subsequently, it is paid great attention to specifically summarize the diverse plasmonic metal/semiconductor photoelectrodes currently being extensively explored for indirect plasmon-induced PEC water splitting. Particularly, different plasmonic metal/semiconductor nanoarchitectures including planar thin films, 1D composited, and 3D spatially hierarchical heterostructures are systematically classified and elucidated. Finally, future perspectives and challenges in triggering further innovative thinking on plasmon-enhanced solar water splitting are envisaged. It is anticipated that this review can provide enriched information on rational design and construction of various plasmonic metal/semiconductor heterostructures for solar-powered plasmon-based PEC devices. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Keyword:

heterostructures; noble metal; photo-electrochemical water splitting; surface plasmon resonance

Community:

  • [ 1 ] [Xiao, F.-X.]College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
  • [ 2 ] [Liu, B.]School of Chemical and Biomedical Engineering, Nanyang Technological University, 62 Nanyang Drive637459, Singapore

Reprint 's Address:

  • [Xiao, F.-X.]College of Materials Science and Engineering, Fuzhou UniversityChina

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Source :

Advanced Materials Interfaces

ISSN: 2196-7350

Year: 2018

Issue: 6

Volume: 5

4 . 7 1 3

JCR@2018

4 . 3 0 0

JCR@2023

ESI HC Threshold:284

JCR Journal Grade:1

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 97

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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