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author:

Qiu, M. (Qiu, M..) [1] | Tao, H. (Tao, H..) [2] | Li, Y. (Li, Y..) [3] | Zhang, Y. (Zhang, Y..) [4]

Indexed by:

Scopus

Abstract:

Density functional theory calculations were carried out to investigate the mechanism of CO2 and CO methanation over pure Cu(100) and Co–Cu bimetallic catalysts. The most favorable pathways for the CO2 and CO hydrogenation were obtained. For the Cu(100) surface, the barriers of the rate-limiting step for the HCOO* and CO* hydrogenation were 122.52 kJ/mol and 106.14 kJ/mol. Because the barrier (77.34 kJ/mol) for the H2CO* hydrogenation is more than the desorption energy of 54.80 kJ/mol, H2CO gas was the main product from the hydrogenation of CO2 and CO on a pure Cu(100) surface. For the Co4/Cu(100) surface, the optimal pathways for the CO2 and CO methanation were the same as those on the Cu(100) surface. The rate-limiting step for CO2 and CO methanation is the H2COO* (barrier of 103.57 kJ/mol) and H2CO* hydrogenation (barrier of 107.80 kJ/mol). Compared to the mechanism of CO2 and CO over Cu(100), the Co dopant can modify the rate-limiting step and decrease the activation barrier. Particularly, the barrier for the H2COH decomposition was changed from 100.96 kJ/mol to 69.81 kJ/mol (CO2 pathway) and 61.26 kJ/mol (CO pathway). Furthermore, the co-adsorbed OH* group affects the hydrogenation pathway of some intermediates rather than electronic structures. © 2019 Elsevier B.V.

Keyword:

Bimetallic alloys; CO2 reduction; Density functional theory; Methane synthesis

Community:

  • [ 1 ] [Qiu, M.]Department of Chemistry, College of Science, Jiangxi Agricultural University, Nanchang, Jiangxi 330045, China
  • [ 2 ] [Tao, H.]College of Chemistry, Fuzhou University, Fuzhou, Fujian 350116, China
  • [ 3 ] [Li, Y.]College of Chemistry, Fuzhou University, Fuzhou, Fujian 350116, China
  • [ 4 ] [Zhang, Y.]College of Chemistry, Fuzhou University, Fuzhou, Fujian 350116, China

Reprint 's Address:

  • [Qiu, M.]Department of Chemistry, College of Science, Jiangxi Agricultural UniversityChina

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Source :

Applied Surface Science

ISSN: 0169-4332

Year: 2019

Volume: 495

6 . 1 8 2

JCR@2019

6 . 3 0 0

JCR@2023

ESI HC Threshold:236

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 35

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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