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author:

Zhu, Y. (Zhu, Y..) [1] | Hu, H. (Hu, H..) [2] | Liu, Y. (Liu, Y..) [3] | Zheng, X. (Zheng, X..) [4] | Ju, S. (Ju, S..) [5] | Lin, W. (Lin, W..) [6] | Guo, T. (Guo, T..) [7] | Li, F. (Li, F..) [8]

Indexed by:

Scopus

Abstract:

In this letter, we report the high-performance quantum dot light-emitting diodes (QLEDs) with a hybrid hole injection layer (HIL) by doping MoOx into poly(3,4-ethylenedioxythiophene): poly(styrene sulfonate) (PEDOT:PSS). By this method, the Fermi level of HIL increases from 4.9 to 5.3 eV, allowing better energy level matching and more efficient hole injection capability. The resultant devices exhibit maximum current efficiency of 18.6 cd/A and peak external quantum efficiency of 18.2%, almost 1.5-folds higher than those (12.7 cd/A and 12.3 %) of the control device based on pristine PEDOT:PSS HIL. Most importantly, the hydrophobicity of PEDOT: PSS on transparent conductive oxide can be dramatically improved upon MoOx doping, which provides promising potential in ink-jet printing for large-area fabrication of devices. © 1980-2012 IEEE.

Keyword:

hole injection layer; light-emitting diodes; MoOx-doped; Quantum dots

Community:

  • [ 1 ] [Zhu, Y.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 2 ] [Hu, H.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 3 ] [Liu, Y.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 4 ] [Zheng, X.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 5 ] [Ju, S.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 6 ] [Lin, W.]MOE Key Laboratory for Analytical Science of Food Safety and Biology, Fuzhou University, Fuzhou, 350116, China
  • [ 7 ] [Guo, T.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 8 ] [Li, F.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China

Reprint 's Address:

  • [Hu, H.]Institute of Optoelectronic Technology, Fuzhou UniversityChina

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Source :

IEEE Electron Device Letters

ISSN: 0741-3106

Year: 2019

Issue: 7

Volume: 40

Page: 1147-1150

4 . 2 2 1

JCR@2019

4 . 1 0 0

JCR@2023

ESI HC Threshold:150

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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