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author:

Ted, Oyama, S. (Ted, Oyama, S..) [1] | Aono, H. (Aono, H..) [2] | Takagaki, A. (Takagaki, A..) [3] | Sugawara, T. (Sugawara, T..) [4] | Kikuchi, R. (Kikuchi, R..) [5]

Indexed by:

Scopus

Abstract:

Silica-based membranes prepared by chemical vapor deposition of tetraethylorthosilicate (TEOS) on γ-alumina overlayers are known to be effective for hydrogen separation and are attractive for membrane reactor applications for hydrogen-producing reactions. In this study, the synthesis of the membranes was improved by simplifying the deposition of the intermediate γ-alumina layers and by using the precursor, dimethyldimethoxysilane (DMDMOS). In the placement of the γ-alumina layers, earlier work in our laboratory employed four to five dipping-calcining cycles of boehmite sol precursors to produce high H2 selectivities, but this took considerable time. In the present study, only two cycles were needed, even for a macro-porous support, through the use of finer boehmite precursor particle sizes. Using the simplified fabrication process, silica-alumina composite membranes with H2 permeance > 10−7 mol m−2 s−1 Pa−1 and H2 /N2 selectivity >100 were successfully synthesized. In addition, the use of the silica precursor, DMDMOS, further improved the H2 permeance without compromising the H2 /N2 selectivity. Pure DMDMOS membranes proved to be unstable against hydrothermal conditions, but the addition of aluminum tri-sec-butoxide (ATSB) improved the stability just like for conventional TEOS membranes. © 2020 by the authors. Licensee MDPI, Basel, Switzerland.

Keyword:

Chemical vapor deposition; Dimethyldimethoxysilane (DMDMOS); Gamma-alumina intermediate layers; Hydrogen helium separation; Hydrothermal stability; Silica-alumina membrane

Community:

  • [ 1 ] [Ted Oyama, S.]College of Chemical Engineering, Fuzhou University, Fuzhou, 350116, China
  • [ 2 ] [Ted Oyama, S.]Department of Chemical Systems Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 3 ] [Ted Oyama, S.]Department of Chemical Engineering, Virginia Tech, Blacksburg, VA 24061, United States
  • [ 4 ] [Aono, H.]Department of Chemical Systems Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 5 ] [Takagaki, A.]Department of Chemical Systems Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 6 ] [Takagaki, A.]Department of Applied Chemistry, Faculty of Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka, 819-0395, Japan
  • [ 7 ] [Sugawara, T.]Department of Chemical Systems Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 8 ] [Kikuchi, R.]Department of Chemical Systems Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan

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Source :

Membranes

ISSN: 2077-0375

Year: 2020

Issue: 3

Volume: 10

4 . 1 0 6

JCR@2020

3 . 3 0 0

JCR@2023

ESI HC Threshold:160

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 12

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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