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author:

Li, Q. (Li, Q..) [1] | Anpo, M. (Anpo, M..) [2] | Wang, X. (Wang, X..) [3]

Indexed by:

Scopus

Abstract:

The present review covers the outline of the application of photoluminescence (PL) spectroscopy to understand the photocatalytic reactions on the bulk semiconducting materials and highly dispersed metal oxide single-site heterogeneous catalysts at their working states. The first part focuses on the applications of PL spectroscopy to elucidate the surface active sites and surface band structures of the inorganic and organic bulk semiconducting photocatalysts at their working states. The second part describes the applications of in situ PL spectroscopy to elucidate the surface active sites of the highly dispersed metal oxide single-site heterogeneous catalysts and their roles in photocatalytic reactions at the molecular level. The last part is a brief conclusion and future direction of PL studies. © 2020, Springer Nature B.V.

Keyword:

Carbon nitride; Photocatalysis; Photoluminescence; Semiconducting materials; Single-site; Transition metal oxides

Community:

  • [ 1 ] [Li, Q.]State Key Laboratory of Photocatalysis on Energy and Environment and College of Chemistry, Fuzhou University, Fuzhou, 350002, China
  • [ 2 ] [Anpo, M.]State Key Laboratory of Photocatalysis on Energy and Environment and College of Chemistry, Fuzhou University, Fuzhou, 350002, China
  • [ 3 ] [Anpo, M.]Department of Applied Chemistry, Osaka Prefecture University, Sakai, Osaka 599-8531, Japan
  • [ 4 ] [Wang, X.]State Key Laboratory of Photocatalysis on Energy and Environment and College of Chemistry, Fuzhou University, Fuzhou, 350002, China

Reprint 's Address:

  • [Anpo, M.]State Key Laboratory of Photocatalysis on Energy and Environment and College of Chemistry, Fuzhou University, State Key Laboratory of Photocatalysis on Energy and Environment and College of Chemistry, Fuzhou UniversityChina

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Source :

Research on Chemical Intermediates

ISSN: 0922-6168

Year: 2020

Issue: 10

Volume: 46

Page: 4325-4344

2 . 9 1 4

JCR@2020

2 . 8 0 0

JCR@2023

ESI HC Threshold:160

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 28

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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