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author:

Zhou, J. (Zhou, J..) [1] | Liu, X. (Liu, X..) [2] | Lai, Y. (Lai, Y..) [3] | Chen, Y. (Chen, Y..) [4] | Qiu, C. (Qiu, C..) [5] | Lei, L. (Lei, L..) [6]

Indexed by:

Scopus

Abstract:

Up to now, most of the emisison wavelengths of the reported scintillators are located in ultra-violet (UV) or visible range. Herein, to further expand the X-ray excited fluorescence emission spectrum, an active core/dual-shell nanocrystal (NC) architecture is used to actualize near-infrared scintillation. Specifically, under the X-ray excitation, near-infrared emission from Nd3+ ions at ~1064 and Yb3+ ions at 980 nm are achieved. The active outer shell with the incorporation of Ce3+ sensitizer ions benefited the enhancement of X-ray excited NIR fluorescence emission intensity owing to the enhanced energy transfer efficiency from Ce3+ to Nd3+ or Yb3+ emission centers. The present studied near-infrared NC scintillator have deeper penetration depth than that of UV and visible, which might be useful for X-ray imaging with improved sensitivity. © 2020 Elsevier B.V.

Keyword:

Ce3+; Core/shell; Nanocrystal; NIR scintillation; X-ray imaging

Community:

  • [ 1 ] [Zhou, J.]College of Chemistry & Materials Science, Longyan UniversityFujian 364000, China
  • [ 2 ] [Zhou, J.]College of Materials Science and Engineering, Fuzhou UniversityFujian 350108, China
  • [ 3 ] [Liu, X.]College of Chemistry & Materials Science, Longyan UniversityFujian 364000, China
  • [ 4 ] [Lai, Y.]College of Chemistry & Materials Science, Longyan UniversityFujian 364000, China
  • [ 5 ] [Lai, Y.]College of Materials Science and Engineering, Fuzhou UniversityFujian 350108, China
  • [ 6 ] [Chen, Y.]College of Chemistry & Materials Science, Longyan UniversityFujian 364000, China
  • [ 7 ] [Qiu, C.]College of Chemistry & Materials Science, Longyan UniversityFujian 364000, China
  • [ 8 ] [Lei, L.]Institute of Optoelectronic Materials and Devices, China Jiliang University, Hangzhou, 310018, China

Reprint 's Address:

  • [Lei, L.]Institute of Optoelectronic Materials and Devices, China Jiliang UniversityChina

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Source :

Optical Materials

ISSN: 0925-3467

Year: 2020

Volume: 107

3 . 8 0 0

JCR@2023

ESI HC Threshold:196

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 3

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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