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author:

Li, X. (Li, X..) [1] | Cheng, Z. (Cheng, Z..) [2] | Fang, Y. (Fang, Y..) [3] | Fu, X. (Fu, X..) [4] | Wang, X. (Wang, X..) [5]

Indexed by:

Scopus

Abstract:

Photoelectrochemical water oxidation by polymeric carbon nitride (PCN) has recently received increasing scientific interest. Herein, phosphorus (P) is doped into PCN (p-PCN) films through in situ polymerization. p-PCN sheets are formed and vertically aligned on a conductive substrate, which is used as a photoanode. The optimal photocurrent density of the photoanode is ≈120 μA cm−2, which is more than two times that of the undoped one. The improved performance is accounted as the introduction of P in PCN. On the one hand, P doping increases the valence potential of PCN and improves the ability of water oxidation. On the other hand, charge transfer is improved by extra charges from P. © 2020 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Keyword:

phosphorus doping; photocatalysis; photoelectrochemical; polymeric carbon nitride; water oxidation

Community:

  • [ 1 ] [Li, X.]State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou University, Fuzhou, 350002, China
  • [ 2 ] [Cheng, Z.]State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou University, Fuzhou, 350002, China
  • [ 3 ] [Fang, Y.]State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou University, Fuzhou, 350002, China
  • [ 4 ] [Fu, X.]State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou University, Fuzhou, 350002, China
  • [ 5 ] [Wang, X.]State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou University, Fuzhou, 350002, China

Reprint 's Address:

  • [Fang, Y.]State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou University, State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou UniversityChina

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Source :

Solar RRL

ISSN: 2367-198X

Year: 2020

Issue: 8

Volume: 4

8 . 5 8 2

JCR@2020

6 . 0 0 0

JCR@2023

ESI HC Threshold:196

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 27

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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