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author:

Fu, Y. (Fu, Y..) [1] | Sun, J. (Sun, J..) [2] | Du, Z. (Du, Z..) [3] | Guo, W. (Guo, W..) [4] | Yan, C. (Yan, C..) [5] | Xiong, F. (Xiong, F..) [6] | Wang, L. (Wang, L..) [7] | Dong, Y. (Dong, Y..) [8] | Xu, C. (Xu, C..) [9] | Deng, J. (Deng, J..) [10] | Guo, T. (Guo, T..) [11] | Yan, Q. (Yan, Q..) [12]

Indexed by:

Scopus

Abstract:

Micro-light-emitting diodes (micro-LEDs) are the key to next-generation display technology. However, since the driving circuits are typically composed of Si devices, numerous micro-LED pixels must be transferred from their GaN substrate to bond with the Si field-effect transistors (FETs). This process is called massive transfer, which is arguably the largest obstacle preventing the commercialization of micro-LEDs. We combined GaN devices with emerging graphene transistors and for the first-time designed, fabricated, and measured a monolithic integrated device composed of a GaN micro-LED and a graphene FET connected in series. The p-electrode of the micro-LED was connected to the source of the driving transistor. The FET was used to tune the work current in the micro-LED. Meanwhile, the transparent electrode of the micro-LED was also made of graphene. The operation of the device was demonstrated in room temperature conditions. This research opens the gateway to a new field where other two-dimensional (2D) materials can be used as FET channel materials to further improve transfer properties. The 2D materials can in principle be grown directly onto GaN, which is reproducible and scalable. Also, considering the outstanding properties and versatility of 2D materials, it is possible to envision fully transparent micro-LED displays with transfer-free active matrices (AM), alongside an efficient thermal management solution. © 2019 by the authors.

Keyword:

Field effect transistors; GaN micro-light-emitting diodes; Graphene; Monolithic integration; Two-dimensional materials

Community:

  • [ 1 ] [Fu, Y.]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing, 100124, China
  • [ 2 ] [Sun, J.]National and Local United Engineering Laboratory of Flat Panel Display Technology, College of Physics and Information Engineering, Fuzhou University, Fuzhou, 350116, China
  • [ 3 ] [Du, Z.]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing, 100124, China
  • [ 4 ] [Guo, W.]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing, 100124, China
  • [ 5 ] [Yan, C.]Department of Information and Automation, Library of Fuzhou University, Fuzhou, 350116, China
  • [ 6 ] [Xiong, F.]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing, 100124, China
  • [ 7 ] [Wang, L.]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing, 100124, China
  • [ 8 ] [Dong, Y.]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing, 100124, China
  • [ 9 ] [Xu, C.]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing, 100124, China
  • [ 10 ] [Deng, J.]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing, 100124, China
  • [ 11 ] [Guo, T.]National and Local United Engineering Laboratory of Flat Panel Display Technology, College of Physics and Information Engineering, Fuzhou University, Fuzhou, 350116, China
  • [ 12 ] [Yan, Q.]National and Local United Engineering Laboratory of Flat Panel Display Technology, College of Physics and Information Engineering, Fuzhou University, Fuzhou, 350116, China

Reprint 's Address:

  • [Sun, J.]National and Local United Engineering Laboratory of Flat Panel Display Technology, College of Physics and Information Engineering, Fuzhou UniversityChina

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Source :

Materials

ISSN: 1996-1944

Year: 2019

Issue: 3

Volume: 12

3 . 0 5 7

JCR@2019

3 . 1 0 0

JCR@2023

ESI HC Threshold:236

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 17

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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