Single atom catalyst by atomic layer deposition technique - Details

author：

Cheng, N. (Cheng, N..) ^[1] | Sun, X. (Sun, X..) ^[2]

Indexed by：

Scopus PKU CSCD

Abstract：

Noble　single-atom　catalysts　have　rapidly　been　attracting　attention　due　to　their　unique　catalytic　properties　and　maximized　utilization.　Atomic　layer　deposition　(ALD)　is　an　emerging　powerful　technique　for　large-scale　synthesis　of　stable　single　atom.　In　this　review,　we　summarize　recent　developments　of　single　atom　synthesized　by　ALD　as　well　as　explore　future　research　direction　and　trends.　©　2017,　Dalian　Institute　of　Chemical　Physics,　Chinese　Academy　of　Sciences.　Published　by　Elsevier　B.V.　All　rights　reserved.

Keyword：

Atomic layer deposition; Catalysis; Mechanism; Noble catalyst; Single-atom

Community：

[ 1 ] [Cheng, N.]Department of Mechanical and Materials Engineering, University of Western Ontario, London, ON N6A 5B9, Canada
[ 2 ] [Cheng, N.]College of Materials Science and Engineering, Fuzhou University, Fuzhou, Fujian 350108, China
[ 3 ] [Sun, X.]Department of Mechanical and Materials Engineering, University of Western Ontario, London, ON N6A 5B9, Canada

Reprint 's Address：

[Sun, X.]Department of Mechanical and Materials Engineering, University of Western OntarioCanada

Email：

xsun@eng.uwo.ca

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Source ：

Chinese Journal of Catalysis

ISSN： 0253-9837

CN： 21-1601/O6

Year： 2017

Issue： 9

Volume： 38

Page： 1508-1514

3 . 5 2 5

JCR@2017

1 5 . 7 0 0

JCR@2023

ESI HC Threshold：226

JCR Journal Grade：1

CAS Journal Grade：2

Cited Count：

WoS CC Cited Count：

SCOPUS Cited Count：

ESI Highly Cited Papers on the List： 0 Unfold All

WanFang Cited Count：

Chinese Cited Count：

30 Days PV： 1

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