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author:

Cui, Y. (Cui, Y..) [1] | Tang, Y. (Tang, Y..) [2] | Wang, X. (Wang, X..) [3]

Indexed by:

Scopus

Abstract:

Graphitic carbon nitride (g-C3N4) hollow spheres have been prepared via one-step solvothermal method without templates. The effects of condensation temperature on the structural, optical and photocatalytic properties of the samples were investigated. The X-ray diffraction (XRD) and Fourier transformed infrared (FTIR) results show that the samples synthesized at dissimilar temperatures have graphitic and heptazine-based conjugate structure. Optical analysis results evidence that the absorption edge shifts toward longer wavelength and PL intensity quenches quickly as the treating temperature increases from 120°C to 180°C. The results demonstrate that higher condensation temperature improves the visible-light absorption and migration rate of photo-induced carriers of samples. The g-C3N4 sample prepared at 180°C presents a highest photocatalytic degradation activity in the degradation of RhB under visible-light irradiation. This study demonstrates a novel strategy for one-step synthesis of hollow spheres shaped polymer semiconductor photocatalyst without templates. © 2015 Elsevier B.V. All rights reserved.

Keyword:

Carbon nitride; Hollow sphere; Microstructure; Photocatalysis; Semiconductors

Community:

  • [ 1 ] [Cui, Y.]School of Environmental and Chemical Engineering, Jiangsu University of Science and Technology, Zhenjiang, Jiangsu 212003, China
  • [ 2 ] [Tang, Y.]School of Environmental and Chemical Engineering, Jiangsu University of Science and Technology, Zhenjiang, Jiangsu 212003, China
  • [ 3 ] [Wang, X.]State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou University, Fuzhou, 350002, China

Reprint 's Address:

  • [Cui, Y.]School of Environmental and Chemical Engineering, Jiangsu University of Science and TechnologyChina

Email:

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Source :

Materials Letters

ISSN: 0167-577X

Year: 2015

Volume: 161

Page: 197-200

2 . 4 3 7

JCR@2015

2 . 7 0 0

JCR@2023

ESI HC Threshold:335

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 112

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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