Well-defined copper(I) fluoroalkoxide complexes for trifluoroethoxylation of aryl and heteroaryl bromides - Details

author：

Huang, R. (Huang, R..) ^[1] | Huang, Y. (Huang, Y..) ^[2] | Lin, X. (Lin, X..) ^[3] | Rong, M. (Rong, M..) ^[4] | Weng, Z. (Weng, Z..) ^[5]

Indexed by：

Scopus

Abstract：

Copper(I)　fluoroalkoxide　complexes　bearing　dinitrogen　ligands　were　synthesized　and　the　structure　and　reactivity　of　the　complexes　toward　trifluoroethoxylation,　pentafluoropropoxylation,　and　tetrafluoropropoxylation　of　aryl　and　heteroaryl　bromides　were　investigated.　Efficiency　drive:　A　series　of　copper(I)　fluoroalkoxide　complexes　bearing　N,N　ligands　have　been　prepared　and　structurally　characterized.　These　well-defined　complexes　serve　as　efficient　reagents　for　the　fluoroalkoxylation　of　aryl　and　heteroaryl　bromides　to　produce　a　wide　range　of　trifluoroethyl,　pentafluoropropyl,　and　tetrafluoropropyl　(hetero)aryl　ethers　in　good　to　excellent　yields.　©　2015　WILEY-VCH　Verlag　GmbH　&　Co.　KGaA,　Weinheim.

Keyword：

C-O bonds; copper; cross-coupling; trifluoroethoxylation

Community：

[ 1 ] [Huang, R.]State Key Laboratory of Photocatalysis on Energy and Environment College of Chemistry, Fuzhou University, Fuzhou, 350108, China
[ 2 ] [Huang, Y.]State Key Laboratory of Photocatalysis on Energy and Environment College of Chemistry, Fuzhou University, Fuzhou, 350108, China
[ 3 ] [Lin, X.]State Key Laboratory of Photocatalysis on Energy and Environment College of Chemistry, Fuzhou University, Fuzhou, 350108, China
[ 4 ] [Rong, M.]State Key Laboratory of Photocatalysis on Energy and Environment College of Chemistry, Fuzhou University, Fuzhou, 350108, China
[ 5 ] [Weng, Z.]State Key Laboratory of Photocatalysis on Energy and Environment College of Chemistry, Fuzhou University, Fuzhou, 350108, China

Reprint 's Address：

[Weng, Z.]State Key Laboratory of Photocatalysis on Energy and Environment College of Chemistry, Fuzhou UniversityChina

Email：

zweng@fzu.edu.cn

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Source ：

Angewandte Chemie - International Edition

ISSN： 1433-7851

Year： 2015

Issue： 19

Volume： 54

Page： 5736-5739

1 1 . 7 0 9

JCR@2015

1 6 . 1 0 0

JCR@2023

ESI HC Threshold：265

JCR Journal Grade：1

Cited Count：

WoS CC Cited Count：

SCOPUS Cited Count： 33

ESI Highly Cited Papers on the List： 0 Unfold All

WanFang Cited Count：

Chinese Cited Count：

30 Days PV： 1

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