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author:

Li, H.-H. (Li, H.-H..) [1] | Li, Y. (Li, Y..) [2] | Gong, A.-W. (Gong, A.-W..) [3] | Wu, C.-X. (Wu, C.-X..) [4] | Zhu, J. (Zhu, J..) [5] | Dong, H.-J. (Dong, H.-J..) [6] | Li, F.-S. (Li, F.-S..) [7] | Chen, Z.R. (Chen, Z.R..) [8]

Indexed by:

Scopus

Abstract:

A new inorganic/organic hybrid [(EV)(Cu 2 I 4 ·2I 2 )]n consisting of inorganic copper iodide (Cu 2 I 4 ·2I 2 ) n 2- layer and organic ethyl viologen (EV 2+ ) has been synthesized and structurally described. In inorganic moiety, the existence of weak |...| bonds extend (Cu 2 I 4 ) n 2n- chains into 2-D layer via the bridged I 2 molecules. The device based on [(EV)(Cu 2 I 4 ·2I 2 )] n sandwiched between Ag and Si/SiO 2 electrodes exhibits reversible electrical bistability behavior with ON/OFF ratio of 10 3 . And its electrical bistability mechanism can be explained as the conformational change with respect to I 2 association and dissociation from copper iodide judging from DFT calculations. © 2015 by American Scientific Publishers.

Keyword:

DFT calculation; Electrical bistability; Inorganic/organic hybrid

Community:

  • [ 1 ] [Li, H.-H.]College of Chemistry, Fuzhou University, Fuzhou, Fujian, 350116, China
  • [ 2 ] [Li, Y.]College of Chemistry, Fuzhou University, Fuzhou, Fujian, 350116, China
  • [ 3 ] [Gong, A.-W.]College of Chemistry, Fuzhou University, Fuzhou, Fujian, 350116, China
  • [ 4 ] [Wu, C.-X.]Institute of Optoelectronic Display, Fuzhou University, Fuzhou, Fujian, 350002, China
  • [ 5 ] [Zhu, J.]College of Chemistry, Fuzhou University, Fuzhou, Fujian, 350116, China
  • [ 6 ] [Dong, H.-J.]College of Chemistry, Fuzhou University, Fuzhou, Fujian, 350116, China
  • [ 7 ] [Li, F.-S.]Institute of Optoelectronic Display, Fuzhou University, Fuzhou, Fujian, 350002, China
  • [ 8 ] [Chen, Z.R.]College of Chemistry, Fuzhou University, Fuzhou, Fujian, 350116, China

Reprint 's Address:

  • [Li, F.-S.]Institute of Optoelectronic Display, Fuzhou UniversityChina

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Source :

Science of Advanced Materials

ISSN: 1947-2935

Year: 2015

Issue: 9

Volume: 7

Page: 1793-1799

1 . 8 1 2

JCR@2015

0 . 9 0 0

JCR@2022

ESI HC Threshold:335

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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