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author:

Li, S. (Li, S..) [1] | Lam, K.-T. (Lam, K.-T..) [2] | Huang, W.-C. (Huang, W.-C..) [3] | Chang, S.-J. (Chang, S.-J..) [4]

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Scopus

Abstract:

We report the effects of microcell layout on the performances of GaN-based highvoltage light-emitting diodes (HV-LEDs). Compared with samples with an S-type layout pattern, it was found that the samples with an I-type layout pattern exhibit smaller forward voltage, larger light output power, lower thermal temperature, and better wall-plug efficiency (WPE). It was also found that we could further improve the performances of HV-LED chips by introducing extra metal fingers to enhance current spreading. Compared with the S-type sample without metal fingers, we could reduce the efficiency droop from 38.6% to 14.8% by using an I-type sample with metal fingers. Furthermore, it was found that WPE reduced by around 40% after a 1000 h aging test for the S-type sample without metal fingers. In contrast, almost no decrease in WPE could be observed from the I-type sample with metal fingers after the same aging time. © 2015 Society of Photo-Optical Instrumentation Engineers.

Keyword:

efficiency droop; GaN; high-voltage light-emitting diodes; layout; metal finger

Community:

  • [ 1 ] [Li, S.]China University of Petroleum (East China), College of Science, Qingdao Shandong, 266580, China
  • [ 2 ] [Lam, K.-T.]Fuzhou University, Institute of Creative Industries Research, Jimei, Xiamen Fujian, 361024, China
  • [ 3 ] [Huang, W.-C.]National Cheng Kung University, Advanced Optoelectronic Technology Center, Department of Electrical Engineering, Tainan, 70101, Taiwan
  • [ 4 ] [Chang, S.-J.]National Cheng Kung University, Advanced Optoelectronic Technology Center, Department of Electrical Engineering, Tainan, 70101, Taiwan

Reprint 's Address:

  • [Chang, S.-J.]National Cheng Kung University, Advanced Optoelectronic Technology Center, Department of Electrical EngineeringTaiwan

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Source :

Journal of Photonics for Energy

ISSN: 1947-7988

Year: 2015

Issue: 1

Volume: 5

1 . 5 2 7

JCR@2015

1 . 5 0 0

JCR@2023

ESI HC Threshold:200

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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