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author:

Wan, D. (Wan, D..) [1] | Abliz, A. (Abliz, A..) [2] | Su, M. (Su, M..) [3] | Liu, C. (Liu, C..) [4] | Jiang, C. (Jiang, C..) [5] | Li, G. (Li, G..) [6] | Chen, H. (Chen, H..) [7] | Guo, T. (Guo, T..) [8] | Liu, X. (Liu, X..) [9] | Liao, L. (Liao, L..) [10]

Indexed by:

Scopus

Abstract:

In this letter, high-performance amorphous indium-gallium-zinc-oxide (a-InGaZnO) and indium-tin-oxide (ITO) nanowire (NW) composite thin-film transistors (TFTs) are fabricated via a sol-gel approach. By incorporating 0.5 wt% ITO NWs into the a-InGaZnO thin film, the composite TFTs can achieve an enhanced field-effect mobility of 76.5 cm2/V · s and a high current density of 73.3 μA/μm with 10-μm channel length. The low-frequency noise (LFN) characteristic of the composite TFTs fits the classical 1/f noise model very well in the frequency range 1 to 1000 Hz. The subthreshold slope and LFN results provide an alternative explanation to the enhanced performance of the composite TFTs due to the decreased interfacial trap density. The a-InGaZnO/ITO NW composite TFTs are one of the promising candidates for the development of high-speed low-cost electronics. © 2017 IEEE.

Keyword:

1/f noise model; Amorphous indium-gallium-zinc-oxide (a-InGaZnO); indium-tin-oxide (ITO) nanowire (NW); low-frequency noise (LFN); thin-film transistors (TFTs)

Community:

  • [ 1 ] [Wan, D.]School of Physics and Technology, Wuhan University, Wuhan, 430072, China
  • [ 2 ] [Abliz, A.]School of Physics and Technology, Wuhan University, Wuhan, 430072, China
  • [ 3 ] [Su, M.]School of Physics and Technology, Wuhan University, Wuhan, 430072, China
  • [ 4 ] [Liu, C.]School of Physics and Technology, Wuhan University, Wuhan, 430072, China
  • [ 5 ] [Jiang, C.]School of Physics and Technology, Wuhan University, Wuhan, 430072, China
  • [ 6 ] [Li, G.]Key Laboratory for Micro-/Nano-Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha, 410082, China
  • [ 7 ] [Chen, H.]Institute of Optoelectronic Display, Fuzhou University, Fuzhou, 350002, China
  • [ 8 ] [Guo, T.]Institute of Optoelectronic Display, Fuzhou University, Fuzhou, 350002, China
  • [ 9 ] [Liu, X.]Key Laboratory for Micro-/Nano-Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha, 410082, China
  • [ 10 ] [Liao, L.]School of Physics and Technology, Wuhan University, Wuhan, 430072, China

Reprint 's Address:

  • [Liao, L.]School of Physics and Technology, Wuhan UniversityChina

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Source :

IEEE Electron Device Letters

ISSN: 0741-3106

Year: 2017

Issue: 11

Volume: 38

Page: 1540-1542

3 . 4 3 3

JCR@2017

4 . 1 0 0

JCR@2023

ESI HC Threshold:177

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 11

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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