In　order　to　reduce　field　shield　effect,　zinc　oxide　(ZnO)　dendritic　structures　were　controlled　by　pattern　technology　and　their　properties　were　studied.　Firstly,　patterned　zinc　oxide　(ZnO)　thin　films　were　prepared　by　the　use　of　photolithography　on　the　ITO　glass　substrate.　Patterned　dendritic　ZnO　arrays　were　successfully　synthesized　on　the　ITO　covered　with　patterned　ZnO　thin　film　by　using　a　simply　electrodeposition　approach.　Then,　the　morphology　and　structure　characteristics　of　as-prepared　ZnO　nanostructures　were　characterized　by　scanning　electron　microscopy　and　X-ray　diffraction,　respectively.　Moreover,　field　emission　properties　of　pattern　ZnO　arrays　were　also　explored.　The　results　show　that　the　patterned　ZnO　arrays　are　circular　arrays　with　the　diameter　of　330　μm,　the　diameter　of　average　ZnO　trunks　are　400~500　nm.　There　are　many　nametapes　on　the　ZnO　trunks.　They　exhibit　good　field　emission　properties　with　a　turn-on　field　of　2.15　V/μm　and　a　field　enhancement　factor　of　16　109.　The　patterned　ZnO　array　is　a　feasible　method　for　improving　field　emission　properties.　©　2017,　Science　Press.　All　rights　reserved.