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author:

Ye, Y. (Ye, Y..) [1] | Chen, T.-Y. (Chen, T.-Y..) [2] | Guo, T.-L. (Guo, T.-L..) [3] | Jiang, Y.-D. (Jiang, Y.-D..) [4]

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Scopus PKU CSCD

Abstract:

The effect of magnetic field assisted heat-treatment on the field emission properties of metalized multi-walled carbon nanotubes (MWNTs) is investigated. The metalized MWNTs are prepared via an electroless plating method, and then the MWNTs/Ni cathodes are fabricated by screen printing. The morphology and composition of MWNTs/Ni were studied by transmission electron microscopy and energy dispersive X-ray detector, and the difference between MWNTs/Ni cathodes heat-treated with or without magnetic field was observed by scanning electron microscopy. The force of a single MWNT coated with Ni was simulated, and the results demonstrate that the magnetic field force could induce the rotation of MWNTs/Ni during magnetic field assisted heat-treatment. The field emission characteristics show that the MWNTs/Ni cathodes heat-treated with magnetic field has a low turn-on field of 0.80 V·μm-1 and high field enhancement factor of 16068, which are attributed to the embossment of MWNTs/Ni from substrates under the magnetic field. © 2014 Chinese Physical Society.

Keyword:

Electroless plating; Field emission; Magnetic field; Metalized multi-walled carbon nanotubes

Community:

  • [ 1 ] [Ye, Y.]College of Physics and Telecommunication Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 2 ] [Chen, T.-Y.]College of Physics and Telecommunication Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 3 ] [Guo, T.-L.]College of Physics and Telecommunication Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 4 ] [Jiang, Y.-D.]State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China

Reprint 's Address:

  • [Guo, T.-L.]College of Physics and Telecommunication Engineering, Fuzhou University, Fuzhou 350002, China

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Source :

Acta Physica Sinica

ISSN: 1000-3290

Year: 2014

Issue: 8

Volume: 63

0 . 8 1 3

JCR@2014

0 . 8 0 0

JCR@2023

ESI HC Threshold:213

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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