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author:

Sun, B.-Z. (Sun, B.-Z..) [1] | Xu, X.-L. (Xu, X.-L..) [2] | Chen, W.-K. (Chen, W.-K..) [3] | Dong, L.-H. (Dong, L.-H..) [4]

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Scopus

Abstract:

The NO oxidation on Cu 2 O(111) with molecular oxygen, dissociated oxygen, and lattice O, was studied by using periodic density functional theory. Cu 2 O could promote NO oxidation via the more favorable Elay-Rideal mechanism. For NO oxidation with molecular oxygen, path II (NO + O 2 ∗ → O ∗ ONO → NO 2 + O ∗ ; NO + O ∗ → NO 2 ∗ → NO 2 ) was found as the most probable route, in which NO 2 desorption is the reaction rate determining step. The NO oxidation reaction with dissociated oxygen is also possible. In this case, O 2 dissociation occurs after surpassing a barrier of 105 kJ/mol. Thereafter, NO molecule can readily react with oxygen adatoms without barrier or with a moderate-low barrier of 49 kJ/mol. Both of the produced NO 2 molecules will release from the surface. The barrier to be surmounted is 53.3 and 103.2 kJ/mol, respectively. The reaction of NO with lattice O has a high barrier and it is very unlikely. The present results enrich our understanding of the catalytic oxidation of NO by metal-oxide catalysts. © 2014 Elsevier B.V. All rights reserved.

Keyword:

Cu 2 O; Density functional calculation; Metal oxides; NO oxidation; Reaction mechanism

Community:

  • [ 1 ] [Sun, B.-Z.]School of Chemistry and Chemical Engineering, Guangxi University, Nanning, 530004, China
  • [ 2 ] [Sun, B.-Z.]Key Laboratory of Coal to Ethylene Glycol and Its Related Technology, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, 350002, China
  • [ 3 ] [Xu, X.-L.]Department of Chemistry, School of Science, Nanchang University, Nanchang, 330031, China
  • [ 4 ] [Chen, W.-K.]Department of Chemistry, Fuzhou University, Fuzhou, 350108, China
  • [ 5 ] [Dong, L.-H.]School of Chemistry and Chemical Engineering, Guangxi University, Nanning, 530004, China

Reprint 's Address:

  • [Sun, B.-Z.]Guangxi University, School of Chemistry and Chemical Engineering, 100, Daxue Road, China

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Source :

Applied Surface Science

ISSN: 0169-4332

Year: 2014

Issue: 1

Volume: 316

Page: 416-423

2 . 7 1 1

JCR@2014

6 . 3 0 0

JCR@2023

ESI HC Threshold:355

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 25

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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