Improving the field-emission properties of carbon nanotubes by magnetically controlled nickel-electroplating treatment - Details

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Abstract：

A　novel　magnetically　controlled　Ni-plating　method　has　been　developed　to　improve　the　field-emission　properties　of　carbon　nanotubes　(CNTs).　The　effect　of　the　magnetic　field　and　Ni-electroplating　on　CNT　field-emission　properties　was　investigated,　and　the　results　are　demonstrated　using　scanning　electron　microscopy,　J　-　E　and　the　duration　test.　After　treatment,　the　turn-on　electric　field　declines　from　1.55　to　0.91　V/μm　at　an　emission　current　density　of　100　μA/cm　2,　and　the　emission　current　density　increases　from　0.011　to　0.34　mA/cm　2　at　an　electric　field　of　1.0　V/μm.　Both　the　brightness　and　uniformity　of　the　CNT　emission　performance　are　improved　after　treatment.　©　2011　Chinese　Physical　Society　and　IOP　Publishing　Ltd.

Keyword：

Carbon nanotubes; field emission; magnetic field; Ni-electroplate

Community：

[ 1 ] [Zheng, L.-W.]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
[ 2 ] [Hu, L.-Q.]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
[ 3 ] [Xiao, X.-J.]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
[ 4 ] [Yang, F.]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
[ 5 ] [Lin, H.]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
[ 6 ] [Guo, T.-L.]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China

Reprint 's Address：

[Guo, T.-L.]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China

Email：

gtl-fzu@yahoo.com.cn

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Source ：

Chinese Physics B

ISSN： 1674-1056

Year： 2011

Issue： 12

Volume： 20

1 . 3 7 6

JCR@2011

1 . 5 0 0

JCR@2023

JCR Journal Grade：2

CAS Journal Grade：3

Cited Count：

WoS CC Cited Count： 0

SCOPUS Cited Count： 6

ESI Highly Cited Papers on the List： 0 Unfold All

WanFang Cited Count：

Chinese Cited Count：

30 Days PV： 2

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