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Abstract:
We report a direct electrochemical deposition process to produce ZnO nanorods or a ZnO thin film on an indium tin oxide (ITO) substrate. The ZnO film was etched by an agarose stamp containing HCl as the etchant to form different patterns. The structure, morphology, and electrochemical properties of the ZnO thin films on the ITO substrate were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), and scanning electrochemical microscopy (SECM). © Editorial office of Acta Physico-Chimica Sinica.
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Acta Physico - Chimica Sinica
ISSN: 1000-6818
Year: 2011
Issue: 11
Volume: 27
Page: 2613-2617
0 . 7 8
JCR@2011
1 0 . 8 0 0
JCR@2023
JCR Journal Grade:4
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ESI Highly Cited Papers on the List: 0 Unfold All
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30 Days PV: 2
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