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author:

Luo, Y. (Luo, Y..) [1] | Cui, X.-L. (Cui, X.-L..) [2] | Xie, J.-J. (Xie, J.-J..) [3]

Indexed by:

Scopus PKU CSCD

Abstract:

TiO2-MoO3 composite nanotube thin films were obtained by the thermal treatment of titanium dioxide nanotube thin films in the presence of MoO3. Titanium dioxide nanotubes (TiO2 NTs) thin films were prepared by the anodic oxidation of titanium foil. The resultant thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), electrochemical impedance spectroscopy (EIS), Mott-Schottky analysis, and photoelectrochemical methods. The XRD patterns showed that an anatase type TiO2was present in the thin films. Nanotube structures for the thin films were observed by SEM. MoO3 was dispersed on the TiO2 NT top surface. Elemental analysis by XPS showed that MoO3 recombined with the TiO2 NTs to form TiO2-MoO3 composite nanotube thin films. The influence of time and temperature of thermal treatment on the photoelectrochemical response for the TiO2-MoO3 composite nanotube thin film electrodes were investigated. The photoelectrochemical response of the TiO2-MoO3 composite nanotube thin film increased under visible light illumination compared with the pristine TiO2 NTs. The highest photoelectrochemical response was observed for the TiO2-MoO3 composite nanotube thin film obtained by thermal treatment at 450 °C for 60 min. © Editorial office of Acta Physico-Chimica Sinica.

Keyword:

MoO3; Photoelectrochemical property; Thermal treatment; Tio2 nanotubes

Community:

  • [ 1 ] [Luo, Y.]Department of Materials Science, Fudan University, Shanghai 200433, China
  • [ 2 ] [Luo, Y.]Institute of Space Power-Sources, Shanghai 200233, China
  • [ 3 ] [Cui, X.-L.]Department of Materials Science, Fudan University, Shanghai 200433, China
  • [ 4 ] [Cui, X.-L.]State Key Laboratory Breeding Base of Photocatalysis, Fuzhou University, Fuzhou, 350002, China
  • [ 5 ] [Xie, J.-J.]Institute of Space Power-Sources, Shanghai 200233, China

Reprint 's Address:

  • [Cui, X.-L.]Department of Materials Science, Fudan University, Shanghai 200433, China

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Source :

Acta Physico - Chimica Sinica

ISSN: 1000-6818

Year: 2011

Issue: 1

Volume: 27

Page: 135-142

0 . 7 8

JCR@2011

1 0 . 8 0 0

JCR@2023

JCR Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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