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author:

Chen, H. (Chen, H..) [1] | Liu, Q. (Liu, Q..) [2]

Indexed by:

Scopus

Abstract:

Double patterning improves the development of immersion lithography, but it brings new challenges including the higher scanning velocity of wafer. In this paper, considering two typical injection types, the three-dimensional computational fluid dynamics model is developed to investigate the effect of injection parameters on immersion liquid during wafer scanning. By analyzing the velocity distribution of immersion flow and normal stress on the lens, the proper parameters of injection are proposed under the typical conditions, and the appropriate parameters which lead to effective renovation with low lens distortion are also given. © (2012) Trans Tech Publications, Switzerland.

Keyword:

Immersion lithography; Injection parameters; Liquid renovation; Wafer scanning

Community:

  • [ 1 ] [Chen, H.]School of Mechanical Engineering and Automation, Fuzhou University, 350108, China
  • [ 2 ] [Liu, Q.]The State Key Laboratory of Fluid Power Transmission and Control, Zhejiang University, 310027, China

Reprint 's Address:

  • [Chen, H.]School of Mechanical Engineering and Automation, Fuzhou University, 350108, China

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Source :

Advanced Materials Research

ISSN: 1022-6680

Year: 2012

Volume: 591-593

Page: 351-355

Language: English

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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