A　scanning　electrochemical　microscope　(SECM)　combined　with　an　inverse　optical　microscope　has　been　used　in　its　lithographic　mode　to　fabricate　microstructures　on　a　ZnO　coated　ITO　substrate.　The　UME　electrode　generated　the　protons　which　served　as　the　etchant　to　dissolve　the　ZnO　film.　High　resolution　microstructuring　was　achieved　with　the　SECM　after　the　addition　of　Tris(hydroxymethyl)aminomethane　(Tris)　to　the　solution.　In　the　etching　solution,　Tris　was　used　as　an　efficient　reactant　to　consume　the　protons,　so　that　the　etchant　could　not　diffuse　far　from　the　tip　electrode.　The　cyclic　voltammetry　technique　was　employed　to　determine　the　appropriate　potential,　about　1.2　V　vs.　SCE,　for　the　generation　of　protons　at　the　tip　electrode.　The　dimensions　of　the　etched　microstructures　were　measured　using　the　optical　microscopic　images　at　different　stages　of　the　etching　process　in　order　to　optimize　the　lithographic　conditions.　＂Point　by　point＂　etching　with　the　SECM　tip　was　used　to　create　the　logo　＂FZU＂　of　Fuzhou　University　on　the　ZnO　film.　©　2012　Elsevier　Ltd.　All　rights　reserved.