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author:

喻辉 (喻辉.) [1] | 戴品强 (戴品强.) [2]

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CQVIP PKU CSCD

Abstract:

采用脉冲电沉积法制备了纳米晶体镍镀层,平均晶粒尺寸约为20nm.采用热分析法、透射电子显微镜(TEM)和X射线衍射方法(XRD)研究了纳米镍镀层的热稳定性.结果表明,纳米晶体镍镀层晶粒开始明显长大温度约为255℃,晶粒长大过程分为两个阶段:低温晶粒异常长大阶段(200~300℃)和晶粒正常长大阶段(300~500℃).原始镍镀层的(111)和(200)面双织构在低温晶粒异常长大阶段仍存在,但在正常长大阶段逐渐消失.100℃加热后镍镀层显微硬度略有增高,随后随着加热温度的升高不断降低.

Keyword:

晶粒生长 热稳定性 电沉积 纳米晶体镍

Community:

  • [ 1 ] [喻辉]福州大学
  • [ 2 ] [戴品强]福州大学

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Source :

金属热处理

ISSN: 0254-6051

CN: 11-1860/TG

Year: 2005

Issue: 6

Volume: 30

Page: 16-18

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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