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author:

彭慧耀 (彭慧耀.) [1] | 于映 (于映.) [2] | 罗仲梓 (罗仲梓.) [3] | 王培森 (王培森.) [4]

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CQVIP PKU CSCD

Abstract:

聚酰亚胺树脂(PI)因其良好的平面化特性、在氧气中易灰化、不完全固化易溶解于碱性显影液、在CHF3等离子气氛中有较强的抗蚀性等性质,在电容RF MEMS开关的制作过程中,应用它作为刻蚀保护层和牺牲层,不但可以使工艺过程得到简化,而且可以对开关的介质层尺寸、牺牲层厚度等图形参数起到很好的控制作用.

Keyword:

MEMS电容式开关 RF 保护层 光刻 牺牲层 聚酰亚胺

Community:

  • [ 1 ] 福州大学电子系,福州350002
  • [ 2 ] 厦门大学萨本栋微机电研究中心,福建厦门360003

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Source :

传感技术学报

ISSN: 1004-1699

Year: 2006

Issue: 05B

Volume: 19

Page: 1896-1899

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count: -1

30 Days PV: 2

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