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author:

Ma, Zechen (Ma, Zechen.) [1] | Li, Ruifeng (Li, Ruifeng.) [2] | Xiong, Rui (Xiong, Rui.) [3] | Zhang, Yinggan (Zhang, Yinggan.) [4] | Xu, Chao (Xu, Chao.) [5] | Wen, Cuilian (Wen, Cuilian.) [6] (Scholars:温翠莲) | Sa, Baisheng (Sa, Baisheng.) [7] (Scholars:萨百晟)

Indexed by:

EI SCIE

Abstract:

Designing the electronic structures of the van der Waals (vdW) heterostructures to obtain high-efficiency solar cells showed a fascinating prospect. In this work, we screened the potential of vdW heterostructures for solar cell application by combining the group III-VI MXA (M = Al, Ga, In and X-A = S, Se, Te) and elementary group VI X-B (X-B = Se, Te) monolayers based on first-principle calculations. The results highlight that InSe/Te vdW heterostructure presents type-II electronic band structure feature with a band gap of 0.88 eV, where tellurene and InSe monolayer are as absorber and window layer, respectively. Interestingly, tellurene has a 1.14 eV direct band gap to produce the photoexcited electron easily. Furthermore, InSe/Te vdW heterostructure shows remarkably light absorption capacities and distinguished maximum power conversion efficiency (PCE) up to 13.39%. Our present study will inspire researchers to design vdW heterostructures for solar cell application in a purposeful way.

Keyword:

first-principle calculations InSe solar cell tellurene van der Waals heterostructure

Community:

  • [ 1 ] [Ma, Zechen]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350100, Peoples R China
  • [ 2 ] [Li, Ruifeng]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350100, Peoples R China
  • [ 3 ] [Xiong, Rui]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350100, Peoples R China
  • [ 4 ] [Wen, Cuilian]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350100, Peoples R China
  • [ 5 ] [Sa, Baisheng]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350100, Peoples R China
  • [ 6 ] [Ma, Zechen]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350100, Peoples R China
  • [ 7 ] [Li, Ruifeng]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350100, Peoples R China
  • [ 8 ] [Xiong, Rui]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350100, Peoples R China
  • [ 9 ] [Wen, Cuilian]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350100, Peoples R China
  • [ 10 ] [Sa, Baisheng]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350100, Peoples R China
  • [ 11 ] [Zhang, Yinggan]Xiamen Univ, Coll Mat, Xiamen 361005, Peoples R China
  • [ 12 ] [Xu, Chao]Xiamen Talentmats New Mat Sci & Technol Co Ltd, Xiamen 361015, Peoples R China

Reprint 's Address:

  • 温翠莲 萨百晟

    [Wen, Cuilian]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350100, Peoples R China;;[Sa, Baisheng]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350100, Peoples R China;;[Wen, Cuilian]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350100, Peoples R China;;[Sa, Baisheng]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350100, Peoples R China

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Source :

MATERIALS

ISSN: 1996-1944

Year: 2021

Issue: 14

Volume: 14

3 . 7 4 8

JCR@2021

3 . 1 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:142

JCR Journal Grade:1

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 14

SCOPUS Cited Count: 8

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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