Photo-assisted　deposited　method　is　often　employed　in　the　metal-organic　chemical　vapor　deposition　whose　ion　source　is　organic　compounds.　It　has　been　proved　to　increase　the　deposition　rate　and　improve　the　crystallinity　of　the　films.　We　demonstrate　a　photo-assisted　sputtering　deposited　method　which　is　used　to　prepare　high　quality　TiO2　films.　The　crystallinity　of　the　films　is　improved　by　the　photo　assistance　without　changing　the　morphology.　And　the　structural　and　optical　properties　remain　the　same.　The　photo-assisted　deposited　TiO2　film　shows　a　H-2　evolution　rate　of　1.62　mu　mol.cm(-2).h(-1)　that　is　about　twice　more　than　that　of　the　pristine　TiO2　film.　It　is　found　the　Mott-Schottky　effect　responds　for　the　photocatalytic　activity.　Photo-assisted　deposited　films　show　an　enhanced　photocatalytic　activity　due　to　the　reduction　of　interface　recombination　and　the　high　efficiency　in　the　transferring　of　photo-generated　carriers.