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author:

Du, Zaifa (Du, Zaifa.) [1] | Li, Dianlun (Li, Dianlun.) [2] | Guo, Weiling (Guo, Weiling.) [3] | Xiong, Fangzhu (Xiong, Fangzhu.) [4] | Tang, Penghao (Tang, Penghao.) [5] | Zhou, Xiongtu (Zhou, Xiongtu.) [6] | Zhang, Yongai (Zhang, Yongai.) [7] | Guo, Tailiang (Guo, Tailiang.) [8] | Yan, Qun (Yan, Qun.) [9] | Sun, Jie (Sun, Jie.) [10]

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EI

Abstract:

The quantum dot (QD) color-conversion efficiency (CCE) in GaN micro-light-emitting diodes ( \mu LEDs) is greatly improved by non-radiative energy transfer (NRET) mechanism. An array of deep nano-holes with a diameter of about 1\mu \text{m} was fabricated in \mu LED mesas ( 40\times 60\,\,\mu \text{m} {2} ) by nanoimprint lithography. The nano-holes were etched straight through the \mu LED active region to ensure that the filled QDs were in extremely close contact with the active region. The absorption efficiency and emission efficiency of QDs are effectively improved by NRET, resulting in a superhigh CCE in QD- \mu LED hybrid devices. Compared to \mu LED devices with conventional spin-coated QDs, the CCE of novel nano-hole \mu LEDs with filled QDs has been enhanced by about 118%. © 1980-2012 IEEE.

Keyword:

Conversion efficiency Energy transfer Gallium nitride III-V semiconductors Nanocrystals Nanoimprint lithography Organic light emitting diodes (OLED) Quantum efficiency Semiconductor quantum dots

Community:

  • [ 1 ] [Du, Zaifa]Key Laboratory of Optoelectronics Technology, Beijing University of Technology, Beijing, China
  • [ 2 ] [Li, Dianlun]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, China
  • [ 3 ] [Li, Dianlun]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 4 ] [Guo, Weiling]Key Laboratory of Optoelectronics Technology, Beijing University of Technology, Beijing, China
  • [ 5 ] [Xiong, Fangzhu]Key Laboratory of Optoelectronics Technology, Beijing University of Technology, Beijing, China
  • [ 6 ] [Tang, Penghao]Key Laboratory of Optoelectronics Technology, Beijing University of Technology, Beijing, China
  • [ 7 ] [Zhou, Xiongtu]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, China
  • [ 8 ] [Zhou, Xiongtu]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 9 ] [Zhang, Yongai]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, China
  • [ 10 ] [Zhang, Yongai]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 11 ] [Guo, Tailiang]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, China
  • [ 12 ] [Guo, Tailiang]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 13 ] [Yan, Qun]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, China
  • [ 14 ] [Yan, Qun]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 15 ] [Sun, Jie]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, China
  • [ 16 ] [Sun, Jie]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China

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Source :

IEEE Electron Device Letters

ISSN: 0741-3106

Year: 2021

Issue: 8

Volume: 42

Page: 1184-1187

4 . 8 1 6

JCR@2021

4 . 1 0 0

JCR@2023

ESI HC Threshold:105

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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