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author:

Wang, Yandong (Wang, Yandong.) [1] | Wu, Wei (Wu, Wei.) [2] | Chen, Runzhe (Chen, Runzhe.) [3] | Lin, Caoxin (Lin, Caoxin.) [4] | Mu, Shichun (Mu, Shichun.) [5] | Cheng, Niancai (Cheng, Niancai.) [6] (Scholars:程年才)

Indexed by:

EI Scopus SCIE CSCD

Abstract:

Water dissociation process is generally regarded as the rate-limiting step for alkaline hydrogen evolution reaction (HER), and severely inhibits the catalytic efficiency of Pt based catalysts. To overcome this problem, the in-situ constructed interfaces of Pt-Co alloy and amorphous cobalt oxide (CoOx) on the carbon powder are designed. The amorphous CoOx at Pt-Co/CoOx interfaces not only provide active sites for water dissociation to facilitate Volmer step, but also produce the strong electronic transfer with Pt-Co. Accordingly, the obtained interfacial catalysts exhibit outstanding alkaline HER performance with a Tafel slope of 29.3 mV.dec(-1) and an ultralow overpotential of only 28 mV at 10 mA.cm(-2). Density functional theory (DFT) reveals that the electronic accumulation on the interfacial Co atom in Pt-Co/CoOx constructing the novel active site for water dissociation. Compared to the Pt-Co, all of the energy barriers for water adsorption, water dissociation and hydrogen adsorption/desorption are reduced in Pt-Co/CoOx interfaces, suggesting a boosted HER kinetics for alkaline HER.

Keyword:

amorphous cobalt oxide dual active site electronic regulation interfacial construction water dissociation

Community:

  • [ 1 ] [Wang, Yandong]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 2 ] [Wu, Wei]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 3 ] [Chen, Runzhe]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 4 ] [Lin, Caoxin]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 5 ] [Cheng, Niancai]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 6 ] [Mu, Shichun]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China

Reprint 's Address:

  • 程年才

    [Cheng, Niancai]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China

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Source :

NANO RESEARCH

ISSN: 1998-0124

Year: 2022

Issue: 6

Volume: 15

Page: 4958-4964

9 . 9

JCR@2022

9 . 6 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:55

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 35

SCOPUS Cited Count: 35

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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