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author:

Zhao, Denglin (Zhao, Denglin.) [1] | Zheng, Yueting (Zheng, Yueting.) [2] | Meng, Tingtao (Meng, Tingtao.) [3] | Zhu, Yangbin (Zhu, Yangbin.) [4] | Jing, Jipeng (Jing, Jipeng.) [5] | Chen, Xiang (Chen, Xiang.) [6] | Gao, Hongjin (Gao, Hongjin.) [7] | Mao, Chaomin (Mao, Chaomin.) [8] | Zheng, Wenchen (Zheng, Wenchen.) [9] | Hu, Hailong (Hu, Hailong.) [10] | Guo, Tailiang (Guo, Tailiang.) [11] | Li, Fushan (Li, Fushan.) [12]

Indexed by:

EI CSCD

Abstract:

Regarding conventional quantum dot light-emitting diodes (QLEDs) fabricated by using the spin-coating (SC) technique, voids and interstitial spaces are inevitable due to unordered quantum dots (QDs) stacking, generating device leakage current under an external bias. In the present study, we fabricated an ultra-homogeneous and highly ordered QD monolayer by adopting the Langmuir-Blodgett (LB) technique. The QD monolayer was transferred as a emissive layer with a horizontal lifting (HL) method to a red QLED, which exhibited high performance with an external quantum efficiency (EQE) of 19.0% and lifetime (T95@100 cd m−2) of 13,324 h. When compared with the SC-based device, the EQE and lifetime were improved by 15% and 183% due to the compact and ordered QD monolayer that lowered the leakage current. Moreover, white QLEDs with stacked QD monolayers could be obtained at a low voltage of 4 V because LB technique is an organic-solvent-free approach avoiding interlayer mixing and controlling the QD layer thickness precisely. In addition, we successfully fabricated an ultra-homogeneous large-area QD monolayer on a rectangular substrate with a size of 9 cm × 5 cm, indicating the promising size scalability of the LB-HL strategy. © 2021, Science China Press and Springer-Verlag GmbH Germany, part of Springer Nature.

Keyword:

Monolayers Nanocrystals Organic light emitting diodes (OLED) Semiconductor quantum dots

Community:

  • [ 1 ] [Zhao, Denglin]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 2 ] [Zhao, Denglin]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350116, China
  • [ 3 ] [Zheng, Yueting]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 4 ] [Meng, Tingtao]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 5 ] [Zhu, Yangbin]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 6 ] [Jing, Jipeng]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 7 ] [Chen, Xiang]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 8 ] [Gao, Hongjin]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 9 ] [Mao, Chaomin]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 10 ] [Zheng, Wenchen]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 11 ] [Hu, Hailong]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 12 ] [Guo, Tailiang]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 13 ] [Guo, Tailiang]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350116, China
  • [ 14 ] [Li, Fushan]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 15 ] [Li, Fushan]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350116, China

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Source :

Science China Materials

ISSN: 2095-8226

Year: 2022

Issue: 3

Volume: 65

Page: 757-763

8 . 1

JCR@2022

6 . 8 0 0

JCR@2023

ESI HC Threshold:91

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 15

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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