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author:

Zhao, L. (Zhao, L..) [1] | Yang, B. (Yang, B..) [2] | Zhuang, G. (Zhuang, G..) [3] | Wen, Y. (Wen, Y..) [4] | Zhang, T. (Zhang, T..) [5] | Lin, M. (Lin, M..) [6] | Zhuang, Z. (Zhuang, Z..) [7] | Yu, Y. (Yu, Y..) [8]

Indexed by:

Scopus

Abstract:

Exploitation of atomic-level principles to optimize the charge transfer on ultrathin 2D heterostructures is an emerging frontier in relieving the energy and environmental crisis. Herein, a facile “topological-atom-extraction” protocol is disclosed, i.e., selective extraction of Zn from ultrathin half-unit-cell ZnIn2S4 (HZIS) can embed thin In2O3 domain into 1.60 nm thick HZIS layer to create an atomically thin in-plane In2O3/HZIS heterostructure. Thanks to the optimal distance and capability of charge separation, the in-plane In2O3/HZIS heterostructure is among the best ZnIn2S4-based CO2 reduction reaction (CRR) photocatalysts, and indeed demonstrates a significant increase (from 6.8- to 128-fold) in CO production rate compared with those of out-plane ZIS@In2O3 and out-plane In2O3-HZIScalcined heterostructures. Density Functional Theory simulation reveals that whereas the out-plane heterostructure has a much smaller ∆q of 0.2–0.25 e, the in-plane heterostructure with “zero distance contact” has an optimal ∆q of 1.05 e between In2O3 and HZIS that induces remarkable charge redistribution on the in-plane heterojunction interface and creates local electric field confined within the ultrathin layer. The charge redistribution efficiently directs the charge-carrier separation in S-scheme photocatalytic system and endows long-lifetime carrier to CRR active HZIS. The findings demonstrate the strong versatility of engineering atomic-level heterojunctions for efficient catalysts design. © 2022 Wiley-VCH GmbH.

Keyword:

2D materials; CO 2 photoreduction; in-plane heterostructures; S-Scheme; topological atom extraction

Community:

  • [ 1 ] [Zhao, L.]College of Materials Science and Engineering, Fuzhou University, New Campus, Fujian, Minhou, 350108, China
  • [ 2 ] [Zhao, L.]Key Laboratory of Advanced Materials Technologies, Fuzhou University, Fuzhou, 350108, China
  • [ 3 ] [Yang, B.]College of Materials Science and Engineering, Fuzhou University, New Campus, Fujian, Minhou, 350108, China
  • [ 4 ] [Yang, B.]Key Laboratory of Advanced Materials Technologies, Fuzhou University, Fuzhou, 350108, China
  • [ 5 ] [Zhuang, G.]College of Materials Science and Engineering, Fuzhou University, New Campus, Fujian, Minhou, 350108, China
  • [ 6 ] [Zhuang, G.]Key Laboratory of Advanced Materials Technologies, Fuzhou University, Fuzhou, 350108, China
  • [ 7 ] [Wen, Y.]College of Materials Science and Engineering, Fuzhou University, New Campus, Fujian, Minhou, 350108, China
  • [ 8 ] [Wen, Y.]Key Laboratory of Advanced Materials Technologies, Fuzhou University, Fuzhou, 350108, China
  • [ 9 ] [Zhang, T.]College of Materials Science and Engineering, Fuzhou University, New Campus, Fujian, Minhou, 350108, China
  • [ 10 ] [Zhang, T.]Key Laboratory of Advanced Materials Technologies, Fuzhou University, Fuzhou, 350108, China
  • [ 11 ] [Lin, M.]College of Materials Science and Engineering, Fuzhou University, New Campus, Fujian, Minhou, 350108, China
  • [ 12 ] [Lin, M.]Key Laboratory of Advanced Materials Technologies, Fuzhou University, Fuzhou, 350108, China
  • [ 13 ] [Zhuang, Z.]College of Materials Science and Engineering, Fuzhou University, New Campus, Fujian, Minhou, 350108, China
  • [ 14 ] [Zhuang, Z.]Key Laboratory of Advanced Materials Technologies, Fuzhou University, Fuzhou, 350108, China
  • [ 15 ] [Yu, Y.]College of Materials Science and Engineering, Fuzhou University, New Campus, Fujian, Minhou, 350108, China
  • [ 16 ] [Yu, Y.]Key Laboratory of Advanced Materials Technologies, Fuzhou University, Fuzhou, 350108, China

Reprint 's Address:

  • [Zhuang, Z.]College of Materials Science and Engineering, New Campus, Fujian, China; ; College of Materials Science and Engineering, New Campus, Fujian, China; 电子邮件: yuyan@fzu.edu.cn

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Source :

Small

ISSN: 1613-6810

Year: 2022

Issue: 28

Volume: 18

1 3 . 3

JCR@2022

1 3 . 0 0 0

JCR@2023

ESI HC Threshold:91

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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