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author:

Shu, Yu (Shu, Yu.) [1] | He, Kaijun (He, Kaijun.) [2] | Xiong, Rui (Xiong, Rui.) [3] | Cui, Zhou (Cui, Zhou.) [4] | Yang, Xuhui (Yang, Xuhui.) [5] | Xu, Chao (Xu, Chao.) [6] | Zheng, Jingying (Zheng, Jingying.) [7] | Wen, Cuilian (Wen, Cuilian.) [8] | Wu, Bo (Wu, Bo.) [9] | Sa, Baisheng (Sa, Baisheng.) [10]

Indexed by:

EI

Abstract:

Graphene-based van der Waals (vdW) heterostructures have shown great potential in electronic and optoelectronic nanodevices. Herein, we investigate the electronic property and Schottky barrier of graphene/GeN3 vdW heterostructure by first-principles calculations. It is noted that the electronic natures of graphene and GeN3 monolayers are well preserved in the heterostructure lattice due to the weak vdW interaction. Interestingly, the p-type Schottky contact in graphene/GeN3 heterostructure with a barrier height of 0.21 eV can be effectively tuned by both vertical and horizontal strains. Herein, the carrier concentration in the graphene layer reaches ∼1013 cm−2 level by strain engineering. It is noteworthy that the designed optoelectronic field-effect transistor based on graphene/GeN3 heterostructure exhibits distinguished responsivity of 0.297 AW−1 and impressive external quantum efficiency of 54.5% under illumination based on further non-equilibrium Green's function simulations. Our findings are of utmost significance for the metal–semiconductor vdW contact and corresponding applications in high-performance electronic and optoelectronic devices. © 2022 Elsevier B.V.

Keyword:

Calculations Carrier concentration Electronic properties Field effect transistors Graphene Graphene transistors Heterojunctions Optoelectronic devices Schottky barrier diodes Strain Van der Waals forces

Community:

  • [ 1 ] [Shu, Yu]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 2 ] [He, Kaijun]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 3 ] [Xiong, Rui]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 4 ] [Cui, Zhou]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 5 ] [Yang, Xuhui]College of Environmental Science and Engineering, Fujian Key Laboratory of Pollution Control & Resource Reuse, Fujian Normal University, Fujian, Fuzhou; 350007, China
  • [ 6 ] [Xu, Chao]Xiamen Talentmats New Materials Science & Technology Co., Ltd, Xiamen; 361015, China
  • [ 7 ] [Zheng, Jingying]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 8 ] [Wen, Cuilian]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 9 ] [Wu, Bo]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 10 ] [Sa, Baisheng]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China

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Source :

Applied Surface Science

ISSN: 0169-4332

Year: 2022

Volume: 604

6 . 7

JCR@2022

6 . 3 0 0

JCR@2023

ESI HC Threshold:91

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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Online/Total:1103/10802226
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