Fogging　and　proximity　effects　(FPEs)　are　two　major　factors　that　cause　inaccurate　exposure　and　layout　pattern　distortions　in　e-beam　lithography.　In　this　article,　we　propose　an　analytical　placement　algorithm　that　considers　both　FPEs.　We　formulate　the　global　placement　problem　as　a　separable　minimization　problem　with　linear　constraints,　where　different　objectives　can　be　tackled　one　by　one　in　an　alternating　fashion.　Then,　we　propose　a　novel　proximal　group　alternating　direction　method　of　multipliers　(ADMM)　to　solve　the　separable　minimization　problem　with　two　subproblems,　where　the　first　subproblem　(associated　with　wirelength　and　density)　is　solved　by　the　steepest　descent　method　without　line　search,　and　the　second　one　(associated　with　the　FPEs)　is　handled　by　an　analytical　scheme.　We　prove　the　property　of　global　convergence　of　the　proximal　group　ADMM　method.　Finally,　the　FPEs-aware　legalization　and　detailed　placement　are　employed　to　legalize　and　improve　the　placement　result.　The　experimental　results　show　that　our　algorithm　is　effective　and　efficient　for　the　addressed　problem.　Our　algorithm　achieved　5.7%　smaller　fogging　variation,　6.8%　lower　proximity　variation,　and　5.4%　lower　runtime　with　a　minor　wirelength　overhead　compared　with　the　state-of-the-art　work.　©　1982-2012　IEEE.