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author:

Meng, Qing-Wei (Meng, Qing-Wei.) [1] | Cheng, Luyang (Cheng, Luyang.) [2] | Ge, Qingchun (Ge, Qingchun.) [3] (Scholars:盖庆春)

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EI

Abstract:

Polyamide (PA) membrane is extensively used in various membrane separation processes due to its easy preparation, high selectivity and good acid-base stability. However, the PA material is vulnerable to the attack of free chlorine which causes PA chlorination degradation and eventually damages the membrane selectivity. As such, developing chlorine-resistant membrane has become a research focus in membrane technology recently. This accelerates the emergence of a large number of novel PA membranes. However, reviews on this aspect are quite rare to date. Thus, providing an updated critical review on the PA-based anti-chlorine membrane is highly needed. This paper aims to critically review the recent development in the PA chlorine-resistant membrane designed specially via the modification of the PA selective layer. The recent advances in the PA anti-chlorine membranes are briefly introduced first. The mechanism and influential factors of the chlorination of PA membrane are subsequently presented. The strengths and limitations of the recently developed PA anti-chlorine membrane are critically evaluated afterward. The challenges and future research directions of the sustainably chlorine-resistant PA membranes are finally discussed. This article can provide insightful guidance for the future development of the PA-based chlorine-resistant membrane. © 2023 The Authors

Keyword:

Chlorination Chlorine Membrane technology

Community:

  • [ 1 ] [Meng, Qing-Wei]College of Environment and Safety Engineering, Fuzhou University, No.2 Xueyuan Road, Fujian; 350116, China
  • [ 2 ] [Cheng, Luyang]College of Environment and Safety Engineering, Fuzhou University, No.2 Xueyuan Road, Fujian; 350116, China
  • [ 3 ] [Ge, Qingchun]College of Environment and Safety Engineering, Fuzhou University, No.2 Xueyuan Road, Fujian; 350116, China

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Source :

Advanced Membranes

Year: 2023

Volume: 3

Cited Count:

WoS CC Cited Count:

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ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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