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author:

Cao, Zi-Xiu (Cao, Zi-Xiu.) [1] | Liu, Chuan-Yu (Liu, Chuan-Yu.) [2] | Li, Jian-Peng (Li, Jian-Peng.) [3] | Dong, Jia-Bin (Dong, Jia-Bin.) [4] | Hu, Shi-Hao (Hu, Shi-Hao.) [5] | Wang, Wei-Huang (Wang, Wei-Huang.) [6] | Wu, Xu (Wu, Xu.) [7] | Zhang, Yi (Zhang, Yi.) [8]

Indexed by:

Scopus SCIE

Abstract:

The structural design of n-i-p in antimony selenide (Sb2Se3) thin film solar cells can effectively improve the low carrier collection efficiency caused by the lower doping concentration of Sb2Se3. However, the unideal carrier transport ability of the intrinsic light-absorbing layer remains a major limitation for its power conversion efficiency improvement. Herein, it is discovered that the carrier transport in Sb2Se3 thin films strongly depends on the film thickness of the absorber layer in n-i-p structure. By exploring the carrier transport mechanism under different thicknesses of light-absorbing layers, a suitable absorber layer with thickness of 550 nm is demonstrated can effectively separate, transport, and extract photogenerated carriers in Sb2Se3 solar cells. Finally, the vapor transport deposition processed Sb2Se3 solar cells achieve the highest PCE of 7.62% with a short-circuit current density of 30.71 mAcm(-2). This finding provides a constructive guidance for the future researches on Sb2Se3 thin film solar cells with n-i-p structure.

Keyword:

n-i-p structure Sb2Se3 solar cell Thickness-dependent carrier transport Vapor transport deposition

Community:

  • [ 1 ] [Cao, Zi-Xiu]Nankai Univ, Inst Photoelect Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 2 ] [Liu, Chuan-Yu]Nankai Univ, Inst Photoelect Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 3 ] [Li, Jian-Peng]Nankai Univ, Inst Photoelect Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 4 ] [Dong, Jia-Bin]Nankai Univ, Inst Photoelect Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 5 ] [Zhang, Yi]Nankai Univ, Inst Photoelect Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 6 ] [Cao, Zi-Xiu]Nankai Univ, Tianjin Key Lab Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 7 ] [Liu, Chuan-Yu]Nankai Univ, Tianjin Key Lab Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 8 ] [Li, Jian-Peng]Nankai Univ, Tianjin Key Lab Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 9 ] [Dong, Jia-Bin]Nankai Univ, Tianjin Key Lab Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 10 ] [Zhang, Yi]Nankai Univ, Tianjin Key Lab Thin Film Devices & Technol, Tianjin 300350, Peoples R China
  • [ 11 ] [Hu, Shi-Hao]Beijing Inst Technol, Adv Res Inst Multidisciplinary Sci, Ctr Interdisciplinary Sci Opt Quantum & NEMS Integ, Sch Phys, Beijing 100081, Peoples R China
  • [ 12 ] [Wu, Xu]Beijing Inst Technol, Adv Res Inst Multidisciplinary Sci, Ctr Interdisciplinary Sci Opt Quantum & NEMS Integ, Sch Phys, Beijing 100081, Peoples R China
  • [ 13 ] [Wang, Wei-Huang]Fuzhou Univ, Inst Micronano Devices & Solar Cells, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China

Reprint 's Address:

  • [Zhang, Yi]Nankai Univ, Inst Photoelect Thin Film Devices & Technol, Tianjin 300350, Peoples R China;;[Wu, Xu]Beijing Inst Technol, Adv Res Inst Multidisciplinary Sci, Ctr Interdisciplinary Sci Opt Quantum & NEMS Integ, Sch Phys, Beijing 100081, Peoples R China;;[Wang, Wei-Huang]Fuzhou Univ, Inst Micronano Devices & Solar Cells, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China

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RARE METALS

ISSN: 1001-0521

Year: 2025

Issue: 5

Volume: 44

Page: 3051-3059

9 . 6 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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