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author:

Shi, Aokun (Shi, Aokun.) [1] | Bai, Zhenxu (Bai, Zhenxu.) [2] | Qi, Yaoyao (Qi, Yaoyao.) [3] | Wang, Yulei (Wang, Yulei.) [4] | Huang, Feng (Huang, Feng.) [5] | Ding, Jie (Ding, Jie.) [6] | Lu, Zhiwei (Lu, Zhiwei.) [7]

Indexed by:

EI

Abstract:

Passive Q-switching and passive mode-locking are the key technologies for ultrafast laser to achieve ultrashort pulse and ultrahigh peak power. The transition metal dihalides (TMDs) turn to be promising saturable absorber (SA) materials due to its outstanding characteristics of wide-band absorption effect, third-order nonlinear magnetic susceptibility and high carrier mobility. The optical and physical properties of different TMDs are affected by the composition and structure. In this review, a variety of SA with different transition metals and chalcogens have been discussed. Also, the breakthrough research on defect regulation based on TMDs, combination of heterostructures were emphasized. Furthermore, the future prospects and challenge have also been addressed. © 2025 Elsevier Ltd

Keyword:

Magnetic susceptibility Nonlinear optics Optical depth Passive mode locking Saturable absorbers Ultrashort pulses

Community:

  • [ 1 ] [Shi, Aokun]Center for Advanced Laser Technology, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin; 300401, China
  • [ 2 ] [Shi, Aokun]Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin; 300401, China
  • [ 3 ] [Bai, Zhenxu]Center for Advanced Laser Technology, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin; 300401, China
  • [ 4 ] [Bai, Zhenxu]Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin; 300401, China
  • [ 5 ] [Qi, Yaoyao]Center for Advanced Laser Technology, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin; 300401, China
  • [ 6 ] [Qi, Yaoyao]Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin; 300401, China
  • [ 7 ] [Wang, Yulei]Center for Advanced Laser Technology, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin; 300401, China
  • [ 8 ] [Wang, Yulei]Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin; 300401, China
  • [ 9 ] [Huang, Feng]College of Mechanical Engineering and Automation, Fuzhou University, Fuzhou; 350108, China
  • [ 10 ] [Ding, Jie]Center for Advanced Laser Technology, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin; 300401, China
  • [ 11 ] [Ding, Jie]Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin; 300401, China
  • [ 12 ] [Lu, Zhiwei]Center for Advanced Laser Technology, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin; 300401, China
  • [ 13 ] [Lu, Zhiwei]Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin; 300401, China

Reprint 's Address:

  • [huang, feng]college of mechanical engineering and automation, fuzhou university, fuzhou; 350108, china;;

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Source :

Optics and Laser Technology

ISSN: 0030-3992

Year: 2025

Volume: 186

4 . 6 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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