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author:

Mao, W. (Mao, W..) [1] | Lin, S. (Lin, S..) [2] | Lin, J. (Lin, J..) [3] | Mei, T. (Mei, T..) [4] | Wang, T. (Wang, T..) [5] | Cai, B. (Cai, B..) [6] | Zhang, J. (Zhang, J..) [7] | Lin, Z. (Lin, Z..) [8]

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Abstract:

Electrowetting electronic paper employs a subtractive color mixing system for color display, which results in a smaller color gamut and potential color distortion. Additionally, it relies on ambient light's diffuse reflection, leading to insufficient brightness. To address these issues, this paper proposes a color space transformation and image adaptive enhancement algorithm for color electrowetting. The algorithm converts the image from the RGB color space to the HSV space, using CLAHE to evenly distribute saturation and improve color performance. The luminance channel is enhanced through guided filtering combined with an improved Retinex algorithm, preserving detail and edge information, and ensuring the electrowetting display maintains realistic visual effects under the same lighting conditions. Experimental results show that the algorithm improves PSNR, SSIM, FSIM, and FSIMc by 19%, 10.8%, 19.19%, and 19.54%, respectively. This algorithm significantly enhances the display performance of electrowetting electronic paper, laying a solid foundation for its commercialization. © 2025 Chinese Academy of Sciences. All rights reserved.

Keyword:

color electrowetting electronic paper color space transformation histogram equalization image enhancement

Community:

  • [ 1 ] [Mao W.]School of Advanced Manufacturing, Fuzhou University, Fujian, Quanzhou, 362252, China
  • [ 2 ] [Mao W.]Fujian Science and Technology Innovation Laboratory for Photoelectric Information, Fujian, Fuzhou, 350116, China
  • [ 3 ] [Lin S.]School of Advanced Manufacturing, Fuzhou University, Fujian, Quanzhou, 362252, China
  • [ 4 ] [Lin S.]Fujian Science and Technology Innovation Laboratory for Photoelectric Information, Fujian, Fuzhou, 350116, China
  • [ 5 ] [Lin J.]School of Advanced Manufacturing, Fuzhou University, Fujian, Quanzhou, 362252, China
  • [ 6 ] [Lin J.]Fujian Science and Technology Innovation Laboratory for Photoelectric Information, Fujian, Fuzhou, 350116, China
  • [ 7 ] [Mei T.]School of Advanced Manufacturing, Fuzhou University, Fujian, Quanzhou, 362252, China
  • [ 8 ] [Mei T.]Fujian Science and Technology Innovation Laboratory for Photoelectric Information, Fujian, Fuzhou, 350116, China
  • [ 9 ] [Wang T.]School of Advanced Manufacturing, Fuzhou University, Fujian, Quanzhou, 362252, China
  • [ 10 ] [Wang T.]Fujian Science and Technology Innovation Laboratory for Photoelectric Information, Fujian, Fuzhou, 350116, China
  • [ 11 ] [Cai B.]School of Advanced Manufacturing, Fuzhou University, Fujian, Quanzhou, 362252, China
  • [ 12 ] [Cai B.]Fujian Science and Technology Innovation Laboratory for Photoelectric Information, Fujian, Fuzhou, 350116, China
  • [ 13 ] [Zhang J.]School of Advanced Manufacturing, Fuzhou University, Fujian, Quanzhou, 362252, China
  • [ 14 ] [Zhang J.]Fujian Science and Technology Innovation Laboratory for Photoelectric Information, Fujian, Fuzhou, 350116, China
  • [ 15 ] [Lin Z.]School of Advanced Manufacturing, Fuzhou University, Fujian, Quanzhou, 362252, China
  • [ 16 ] [Lin Z.]Fujian Science and Technology Innovation Laboratory for Photoelectric Information, Fujian, Fuzhou, 350116, China

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Source :

Opto-Electronic Engineering

ISSN: 1003-501X

Year: 2025

Issue: 2

Volume: 52

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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