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author:

Ning, Shujun (Ning, Shujun.) [1] | Wei, Zhiyuan (Wei, Zhiyuan.) [2] | Chen, Zhening (Chen, Zhening.) [3] | Wu, Tianmin (Wu, Tianmin.) [4] | Zhang, Lu (Zhang, Lu.) [5]

Indexed by:

SCIE

Abstract:

Crystal defects and morphological modifications are popular strategies to enhance the catalytic activity of heterogeneous semiconductor photocatalysts. Despite defect engineering and morphology control show their successful applications in ZnO, the effects of curved surface modifications on the photocatalytic performance of ZnO and their interplay with the defect formation remain unclear. To resolve this puzzle, we systemically investigate the joint effects of curvature and defect formation on the electronic structure, optoelectronic properties, and photocatalytic performance of ZnO slabs using first-principles calculations. We find that curvature deformation effectively narrows the electronic bandgap by up to 1.6 eV and shifts the p-/d-band centers, thereby enhancing light absorption in the visible and near-ultraviolet regions. Besides, curvature deformation stimulates self-polarization, facilitating the separation of photogenerated electrons and holes. Also, curvature deformation promotes the formation of defects by reducing defect formation energy (by up to 1.0 eV), thus creating abundant reaction sites for photocatalysis. Intriguingly, the synergistic interaction between curvature and defect deformation further strengthens the self-polarization, narrows the electronic bandgaps, adjusts the p-/d-band centers to improve the optoelectronic properties, and influences the dissociation and free energy barriers of intermediates. Consequently, our findings reveal that this synergy substantially enhances the photocatalytic performance of ZnO slabs, providing deeper insights into the role of defect engineering and morphology control on photocatalysis. (c) 2025 Published by Elsevier B.V. on behalf of Chinese Chemical Society and Institute of Materia Medica, Chinese Academy of Medical Sciences.

Keyword:

Curvature deformation Defect engineering First-principles calculation Photocatalysis ZnO slab

Community:

  • [ 1 ] [Ning, Shujun]Fuzhou Univ, Coll Chem, Fuzhou 350108, Peoples R China
  • [ 2 ] [Wei, Zhiyuan]Fuzhou Univ, Coll Chem, Fuzhou 350108, Peoples R China
  • [ 3 ] [Ning, Shujun]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Peoples R China
  • [ 4 ] [Wei, Zhiyuan]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Peoples R China
  • [ 5 ] [Chen, Zhening]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Peoples R China
  • [ 6 ] [Zhang, Lu]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Peoples R China
  • [ 7 ] [Ning, Shujun]Univ Chinese Acad Sci, Fujian Coll, Fuzhou 350002, Peoples R China
  • [ 8 ] [Wei, Zhiyuan]Univ Chinese Acad Sci, Fujian Coll, Fuzhou 350002, Peoples R China
  • [ 9 ] [Chen, Zhening]Univ Chinese Acad Sci, Beijing 100049, Peoples R China
  • [ 10 ] [Zhang, Lu]Univ Chinese Acad Sci, Beijing 100049, Peoples R China
  • [ 11 ] [Chen, Zhening]Xiamen Univ, Fujian Prov Key Lab Theoret & Computat Chem, Xiamen 361005, Peoples R China
  • [ 12 ] [Wu, Tianmin]Xiamen Univ, Fujian Prov Key Lab Theoret & Computat Chem, Xiamen 361005, Peoples R China
  • [ 13 ] [Zhang, Lu]Xiamen Univ, Fujian Prov Key Lab Theoret & Computat Chem, Xiamen 361005, Peoples R China
  • [ 14 ] [Wu, Tianmin]Fujian Normal Univ, Coll Photon & Elect Engn, Key Lab OptoElect Sci & Technol Med, Fujian Prov Key Lab Photon Technol,Minist Educ, Fuzhou 350117, Peoples R China

Reprint 's Address:

  • [Zhang, Lu]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Peoples R China;;[Zhang, Lu]Univ Chinese Acad Sci, Beijing 100049, Peoples R China;;[Wu, Tianmin]Xiamen Univ, Fujian Prov Key Lab Theoret & Computat Chem, Xiamen 361005, Peoples R China;;[Zhang, Lu]Xiamen Univ, Fujian Prov Key Lab Theoret & Computat Chem, Xiamen 361005, Peoples R China;;[Wu, Tianmin]Fujian Normal Univ, Coll Photon & Elect Engn, Key Lab OptoElect Sci & Technol Med, Fujian Prov Key Lab Photon Technol,Minist Educ, Fuzhou 350117, Peoples R China

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Source :

CHINESE CHEMICAL LETTERS

ISSN: 1001-8417

Year: 2025

Issue: 7

Volume: 36

9 . 4 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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