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author:

Qian, Cheng (Qian, Cheng.) [1] | Zhang, Xiaoqiong (Zhang, Xiaoqiong.) [2] | Chen, Xingyu (Chen, Xingyu.) [3] | Su, Longju (Su, Longju.) [4] | Chen, Rong (Chen, Rong.) [5] | Wen, Jiansen (Wen, Jiansen.) [6] | Wu, Bo (Wu, Bo.) [7] (Scholars:吴波)

Indexed by:

Scopus SCIE

Abstract:

Lightweight high-entropy alloys (LHEAs) with low density and high strength are considered to be the next generation of lightweight materials. Al-Cr-Mo-Ti-based LHEAs, in particular, have gained intensive attention due to their excellent mechanical properties and high-temperature oxidation resistance. This study investigates the lattice distortion, mechanical properties, and surface oxidation mechanism of BCC_AlCrMoTi and AlCrMoTiV LHEAs based on site preference. The relative lattice distortions of BCC_AlCrMoTi and AlCrMoTiV LHEAs were calculated to be 4.78% and 6.12%, respectively, with corresponding hardness values of 628.50 HV and 553.20 HV. The results indicate that the addition of V exacerbates lattice distortion, thereby inducing the alloy softening. Surface oxygen adsorption energy calculations demonstrate significant variations at hollow sites, with Ti and V atoms exhibiting stronger adsorption. As surface oxygen coverage increases, the work function of both alloys increases gradually. Notably, the BCC_AlCrMoTiV LHEA consistently exhibits higher surface work function and average adsorption energy, suggesting that the addition of V reduces the surface oxidation activity. Analysis of the electronic structure reveals the shift in adsorption sites of O atoms and the reduced capacity for successive O atom adsorption. This study provides valuable insights for the mechanical properties and oxidation behaviors of Al-Cr-Mo-Ti-based LHEAs.

Keyword:

Lattice distortion Lightweight high-entropy alloys (LHEAs) Mechanical properties Oxidation mechanism Site occupying fractions (SOFs)

Community:

  • [ 1 ] [Qian, Cheng]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 2 ] [Zhang, Xiaoqiong]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 3 ] [Chen, Xingyu]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 4 ] [Su, Longju]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 5 ] [Chen, Rong]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 6 ] [Wen, Jiansen]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 7 ] [Wu, Bo]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 8 ] [Qian, Cheng]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 9 ] [Zhang, Xiaoqiong]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 10 ] [Chen, Xingyu]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 11 ] [Su, Longju]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 12 ] [Chen, Rong]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 13 ] [Wen, Jiansen]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 14 ] [Wu, Bo]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China
  • [ 15 ] [Wu, Bo]Fuzhou Univ, Sch Adv Mfg, Mat Design & Manufacture Simulat Facil, Jinjiang 362200, Peoples R China

Reprint 's Address:

  • 闻健森 吴波

    [Wen, Jiansen]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China;;[Wu, Bo]Fuzhou Univ, Multiscale Computat Mat Facil, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China;;[Wen, Jiansen]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China;;[Wu, Bo]Fuzhou Univ, Mat Genome Inst, Coll Mat Sci & Engn, Fuzhou 350100, Peoples R China;;[Wu, Bo]Fuzhou Univ, Sch Adv Mfg, Mat Design & Manufacture Simulat Facil, Jinjiang 362200, Peoples R China

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SURFACES AND INTERFACES

ISSN: 2468-0230

Year: 2025

Volume: 72

5 . 7 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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