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author:

Zhuang, Jiachang (Zhuang, Jiachang.) [1] | Jia, Lemin (Jia, Lemin.) [2] | Lu, Yaoping (Lu, Yaoping.) [3] | Zheng, Zhenjie (Zheng, Zhenjie.) [4] | Li, Titao (Li, Titao.) [5] | Zhu, Shoudong (Zhu, Shoudong.) [6] | Xu, Xiaorui (Xu, Xiaorui.) [7] | Wang, Chenxi (Wang, Chenxi.) [8] | Zhang, Haizhong (Zhang, Haizhong.) [9] | Zhu, Minmin (Zhu, Minmin.) [10] | Lu, Xiaoqiang (Lu, Xiaoqiang.) [11]

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EI

Abstract:

Conventional Ga2O3-based solar-blind photodetectors typically require a high bias voltage for efficient operation, leading to significant energy consumption. To address this, we propose an alternative approach using MOCVD-grown homoepitaxial β-Ga2O3 thin films on (100) Sn-doped β-Ga2O3 wafer to develop photodetectors with ultra-low bias and high gain. A graphene/ Ga2O3 heterojunction device was fabricated, exhibiting an exceptionally low dark current of 0.1nA and a photocurrent ratio of 104 at −5 V, along with a suppression ratio (R254nm/R405nm) of 1800 at 0 V. By leveraging graphene's carrier-carrier scattering and Ga2O3′s UV absorption, the device achieved a responsivity increase from 0.04 mA/W (0 V) to 30 mA/W (−0.5 V), equivalent to a 73944 % enhancement, while the detectivity improved by 1096 %, reaching 2.68 × 1012 Jones. This work provides insights into the development of highly sensitive, low-power solar-blind UV photodetectors. © 2025 Elsevier Ltd

Keyword:

Bias voltage Charge carriers Energy efficiency Gallium compounds Graphene Graphene devices Heterojunctions Light absorption Photodetectors Tin compounds Tungsten compounds

Community:

  • [ 1 ] [Zhuang, Jiachang]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 2 ] [Jia, Lemin]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 3 ] [Lu, Yaoping]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 4 ] [Zheng, Zhenjie]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 5 ] [Li, Titao]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 6 ] [Li, Titao]FZU-Jinjiang Joint Institute of Microelectronics, School of Advanced Manufacturing, Jinjiang Science and Education Park, Fuzhou University, Jinjiang; 362200, China
  • [ 7 ] [Zhu, Shoudong]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 8 ] [Xu, Xiaorui]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 9 ] [Wang, Chenxi]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 10 ] [Zhang, Haizhong]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 11 ] [Zhang, Haizhong]FZU-Jinjiang Joint Institute of Microelectronics, School of Advanced Manufacturing, Jinjiang Science and Education Park, Fuzhou University, Jinjiang; 362200, China
  • [ 12 ] [Zhu, Minmin]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 13 ] [Zhu, Minmin]FZU-Jinjiang Joint Institute of Microelectronics, School of Advanced Manufacturing, Jinjiang Science and Education Park, Fuzhou University, Jinjiang; 362200, China
  • [ 14 ] [Lu, Xiaoqiang]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350108, China

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Source :

Optics and Laser Technology

ISSN: 0030-3992

Year: 2025

Volume: 192

4 . 6 0 0

JCR@2023

Cited Count:

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SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

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Chinese Cited Count:

30 Days PV: 0

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